1) Pulsed Plasma Deposition
脉冲等离子体沉积
1.
05O thin films were prepared on glass substrates at room temperature by pulsed plasma deposition process, where the Cu0.
05O靶材,采用脉冲等离子体沉积技术在室温条件下普通玻璃衬底上制备了Cu0。
2) High intensity pulsed ion beam ablation plasma deposition(HIPIBAPD)
强流脉冲离子束烧蚀等离子体沉积
3) Plasma enhanced pulsed laser deposition (PE-PLD)
等离子体增强脉冲激光溅射沉积(PE-PLD)
5) plasma-enhanced pulsed laser deposition(PE-PLD)
等离子体增强脉冲激光沉积
1.
In this paper,high quality orthorhombic boron nitride((o-BN)) films were prepared on Si(100) substrate by plasma-enhanced pulsed laser deposition(PE-PLD) for the first time.
利用等离子体增强脉冲激光沉积系统在Si(100)基底上沉积出了高质量的o-BN薄膜,利用红外光谱(FTIR)、X射线衍射谱(XRD)和原子力显微镜照片对o-BN薄膜进行了表征。
6) jet-RF-PEPLD
喷射RF射频等离子体增强脉冲激光沉积(jet-RF-PEPLD)
补充资料：脉冲
1.指电流或电压短暂的起伏变化。各种高频脉冲广泛用在无线电技术中。 2.指变化规律类似电脉冲的现象。如脉冲激光器。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条