1) CrN_X multilayer Coatings
CrN_X多层膜
2) Cr/CrNx coating
Cr/CrN_x薄膜
3) CrN_x films
CrN_x薄膜
1.
TiN films and CrN_x films have found several important applications in cutting tools,die mold,decoration,microelectronics, biotechnology field and so on.
在过去的二十几年里,物理气相沉积(PVD)过渡族金属氮化物涂层的研究得到了迅速的发展,其中最早应用于金属表面的涂层是TiN,其次是CrN_x薄膜。
5) multilayers
多层膜
1.
Electrodeposition and giant magnetoresistance of Ni_(80)Fe_(20)/Cu nanometer multilayers;
电沉积Ni_(80)Fe_(20)/Cu纳米多层膜及其巨磁电阻效应
2.
Thickness Evaluation for Short Period Metallic Multilayers;
小周期金属多层膜厚度评价
3.
Correlation among magnetic properties, perpendicular magneticrecording properties and microstructure of[Co_(85)Cr_(15) /Pt]_(20) multilayers;
多层膜[Co_(85)Cr_(15)/Pt]_(20)的磁性、垂直磁记录特性和微结构的关系
6) multilayer films
多层膜
1.
Studies on electrochemistry sensitivity of multilayer films electrodes containing glucose oxidase;
葡萄糖氧化酶多层膜修饰电极的电化学性能的研究
2.
Properties of ZnO/Ag/ZnO multilayer films prepared at room temperature;
室温下制备的ZnO/Ag/ZnO多层膜的性能
3.
UV-Vis spectra show that the absorbance values at characteristic wavelengths of the multilayer films increase almost linearly with the number of chitosan/PTA bilayers, suggesting that the deposition process is regular and hi.
将正电荷的壳聚糖与负电荷的磷钨酸溶液通过静电作用交替沉积在基底上组装复合多层膜。
补充资料：[3-(aminosulfonyl)-4-chloro-N-(2.3-dihydro-2-methyl-1H-indol-1-yl)benzamide]
分子式：C16H16ClN3O3S
分子量：365.5
CAS号：26807-65-8
性质：暂无
制备方法：暂无
用途：用于轻、中度原发性高血压。
分子量：365.5
CAS号：26807-65-8
性质：暂无
制备方法：暂无
用途：用于轻、中度原发性高血压。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条