1) double resist exposure
双掩膜曝光
2) modulating exposure of excimer laser by means of amplitude mask
准分子激光振幅掩膜调制曝光
3) Photomask
['fəutəumɑ:sk]
光刻掩膜
1.
A Simple Photomask with Photoresist Mask Layer for Ultraviolet-Photolithography and Its Application for Selectively Photochemical Surface Modification of Polymers;
光胶做挡光层的紫外光刻掩膜用于高聚物芯片表面选择性光化学改性
4) photomask
['fəutəumɑ:sk]
光学掩膜
5) photo-mask lithography
掩膜光刻
1.
To develop a simple low-cost method for general microcups of electronic paper,the chosen methacrylic ester formulation consisted of some function units,such as solvent-resistance units,flexibility and adhesion promoting units,was accomplished through photo-mask lithography.
采用丙烯酸酯材料,以含羧酸的低聚物交联所得的网状结构为抗蚀单元,以聚酯、聚氨酯、异冰片酯单元等为柔性附着力促进单元,通过掩膜光刻法制得微杯结构。
6) reduced mask printing
缩小掩模曝光
补充资料：双掩
1.捕鱼用具名。
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参考词条