1.
Silicon Nitride Thin Film Deposited by PECVD as a Protecting Layer on Photolithography Mask
PECVD淀积Si_3N_4作为光刻掩膜版的保护膜
2.
Phase Shift Mask Monitor Scanner Focus;
利用相移光刻掩膜版监测光刻机台焦距
3.
Multilayer Dielectric Gratings: In-situ Monitoring of Duty Cycle of photoresist Mask and Ion-Beam-Etched Groove Depth;
介质膜光栅：光刻胶掩模占宽比和离子束刻蚀槽深的监控
4.
electron chrome mask
电子束光刻用铬掩模
5.
photoresist controlled etch
光刻胶掩蔽控制腐蚀
6.
Fabrication and Characterization of General Microcups with Flexibility and Solvent-resistance by UV Photo-mask Lithography
掩膜光刻法制备柔性抗蚀电子纸微杯及其性能表征
7.
Thermal Deformation of EUV Mask and its Influence on Lithographic Performance;
极紫外光刻掩模热变形及其对光刻性能的影响
8.
Improving the Profiles of Imaging Patterns by Optimizing Mask in DMD-Based Maskless Photolithography
优化掩模分布改善数字光刻图形轮廓
9.
Study on the Characteristic of Appearance of Multilayer Dielectric Grating Mask;
多层介质膜光栅掩膜形貌特性的研究
10.
Profile Control and Detection of Holographically Recorded Photoresist Grating Masks;
光刻胶全息光栅掩模槽形的控制和检测
11.
Chrome thin films for hard surface photomasks
GB/T15870-1995硬面光掩模用铬薄膜
12.
Mark micromachining laser scanning system controlled by microcomputer
掩膜微加工激光扫描单片机控制系统
13.
Design of Maskless Lithography Image System Based on DMD;
基于DMD的数字无掩模光刻成像系统设计
14.
The research results show that IIL can get the high resolution more effectively than conventional optical lithography (OL).
研究结果表明，掩模投影成像干涉光刻技术比传统投影光刻能够得到更高的光刻分辨率。
15.
The beam division method in maskless laser interference photolithography can be divided into wave-front division and amplitude division.
无掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。
16.
Profile Control and Detection of Multi-layer Dielectric Grating Masks;
多层介质膜光栅掩模槽形的控制与检测
17.
The Design and Implementation of Data Storage Management System in Photomask Manufacture
光掩膜生产中数据存储管理系统的设计与实现
18.
Progress in Mask Materials Used for Super-RENS Optical Storage
用于超分辨近场结构光盘存储的掩膜材料