1) electron-baem spot
电子束光点
2) spot wobbling circuit
电子束摆动电路;光点摆动电路
3) electron beam lithography
电子束曝光
1.
Research of figures with high aspect ratio made by electron beam lithography system;
利用电子束曝光系统制作高深宽比图形的研究
2.
Studies of energy dissipation distribution in low-energy electron beam lithography by Monte Carlo method;
Monte Carlo方法研究低能电子束曝光沉积能分布规律
4) electron beam lithography
电子束光刻
1.
Principle of electron beam lithography and its application on the nanofabrication and nanodevice;
电子束光刻技术的原理及其在微纳加工与纳米器件制备中的应用
2.
Methods of proximity effect correction in electron beam lithography;
电子束光刻中邻近效应校正的几种方法
3.
Application of chemically amplified resists in electron beam lithography;
化学放大胶在电子束光刻技术中的应用
5) EBF
电子束荧光
1.
Point measurements have been implemented with Electron Beam Fluorescence (EBF) using detection of X-ray radiation and Coherent anti-Stokes Raman Scattering (CARS).
点的测量采用X射线辐射和相干反 -Stokes Raman散射(CARS)探测的电子束荧光(EBF)实现。
6) E-beam lithography
电子束光刻
1.
For fabricating X-ray mask of high line-density X-ray transmission gratings,the field stitching of E-beam lithography was analyzed when patterning high line-density gratings;by using pattern correction and low sensitive 950 k PMMA resist,the proximity effect of electron beam was effectively depressed when exposing thick resist spun on polyimide membrane.
为了制备高线密度X射线透射光栅掩模,分析了电子束光刻中场拼接对高线密度光栅图形的影响;利用几何校正技术和低灵敏度的950 k的PMMA电子束抗蚀剂,克服了电子束的邻近效应对厚胶图形曝光的影响。
2.
We present an all-e-beam lithography(EBL) process for the patterning of photonic crystal waveguides.
以光子晶体Fabry-Perot腔为例,提出了全电子束光刻制作光子晶体波导器件的解决方案。
补充资料：电子束
由阴极射线产生的束状电子流。电子显微镜和电视机就是利用电子束形成影像的。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条