1.
raster scan electron beam lithography
光栅扫描电子束光刻
2.
vector scan electron beam lithography
矢量扫描电子束光刻
3.
electron chrome mask
电子束光刻用铬掩模
4.
direct write electron beam system
直写式电子束光刻装置
5.
raster scan electron beam system
光栅扫描电子束光刻系统
6.
The Chemically Amplified Resist Composition and Its Lithography for Electronic Beam;
化学增幅光刻胶及其在电子束光刻中的应用
7.
Study of Internal Proximity Effect Correction in Electron-Beam Lithograph
电子束光刻中的内部邻近效应校正技术研究
8.
Electron-beam lithography with a novel multilevel resist structure defines the pattern.
采用新型的多层抗蚀剂结构的电子束光刻来形成图形。
9.
Study of 3D Fabrication and Proximity Effect Technique in Electron Beam Lithography;
电子束光刻的三维加工和邻近效应校正技术研究
10.
Study on Monte Carlo Simulation of Electron Beam Lithography and Proximity Effect Correction Technique;
电子束光刻的Monte Carlo模拟及邻近效应校正技术研究
11.
Research on Electron Beam Nanolithogrpahy Based on AFM;
基于AFM的电子束纳米级光刻技术研究
12.
The most prevalent procedure is to use photolithography or electron-beam lithography to produce a pattern in a layer of photoresist on the surface of a silicon wafer.
最常用的步骤是用光蚀刻或电子束蚀刻法，在矽晶圆表面的光阻层上制作出图案。
13.
variable shaped electron beam exposure system
可变电子束曝光装置
14.
electron-beam sustainer-pumped laser
电子束持续抽运激光器
15.
electron beam projection exposure apparatus
电子束投影曝光装置
16.
electron beam pumping semiconductor laser
电子束半导体激光器
17.
cool beam low volatage electronic projective lamp
冷光束低压电子投影灯
18.
The light photons, or bundle of light energy, knock electrons in the chromium atoms.
光子，即光能束，冲击铬原子中的电子。