1.
Preparation of Metal Nanoparticles by Laser Ablation and Its Spectral Properties Study;
激光刻蚀法制备金属纳米颗粒及其光谱特性研究
2.
The Study of Reticulating IRFPA by Laser Etching
激光刻蚀法网格化热释电红外焦平面探测器的实验研究
3.
laser engraving, laser etching
激光雕刻，激光蚀刻
4.
gas discharge etching
气体放电蚀刻[法]
5.
Concave Microlens Arrays Produced by Femtosecond Laser With HF Acid Etching
飞秒激光和酸刻蚀方法制作凹面微透镜阵列
6.
The most prevalent procedure is to use photolithography or electron-beam lithography to produce a pattern in a layer of photoresist on the surface of a silicon wafer.
最常用的步骤是用光蚀刻或电子束蚀刻法，在矽晶圆表面的光阻层上制作出图案。
7.
photoresist controlled etch
光刻胶掩蔽控制腐蚀
8.
fine featured resist
精细结构光刻用抗蚀剂
9.
Improvement for Extraction Efficiency of Vertical GaN-Based LED on Si Substrate by Photo-Enhanced Wet Etching
光增强湿法刻蚀提高Si衬底垂直结构GaN基LED的出光效率
10.
Over 8 years experience in Implant /Diffusion/ Etch/ Photo process.
8年注入/扩散/刻蚀/光刻经验。
11.
bichromated albumen process
重铬酸盐蛋白蚀刻法
12.
SiO_2/Si dry etching with XeF_2
XeF_2对SiO_2/Si的干法刻蚀
13.
In situ Monitoring Etch Process and Endpoint for LSI by the Plasma Emission Spectroscopy
大规模集成电路刻蚀过程和终点的在线监测──等离子发射光谱法
14.
Studies of Dry Etching and Ions Implantation on the Luminescence Property of Ⅲ-Ⅴ Group Semiconductor Quantum Wells;
干法刻蚀和离子注入影响Ⅲ-Ⅴ族半导体量子阱发光特性研究
15.
Vacuum-ultraviolet Blazed Silicon Gratings Anisotropically Wet-etched by a Native-oxide Mask
利用天然氧化层掩模的真空紫外硅闪耀光栅的湿法刻蚀制作
16.
Fabrication and Characterization of General Microcups with Flexibility and Solvent-resistance by UV Photo-mask Lithography
掩膜光刻法制备柔性抗蚀电子纸微杯及其性能表征
17.
PROCESS PARAMETERS DETERMINATION OF ETCHING LITHOGRAPHY SERVO DISK BY HF SPUTTERING
利用高频溅射刻蚀光刻伺服盘工艺参数的确定
18.
brilliant cutting
(玻璃)磨光刻花法