1) mask programmable logic array
掩模程控逻辑阵列
2) mpla
掩模程控逻辑阵列
3) mask
掩模
1.
Multilayers on Extreme Ultraviolet Lithography Masks and Illumination Error;
极紫外投影光刻掩模的多层膜与照明误差
2.
Fabrication of continuous relief mask for diffractive plane focus lens;
连续型平面衍射聚光透镜掩模的制作
3.
A Novel GMTI Method Based on Masking Technique;
一种利用掩模法抑制杂波的GMTI方法
4) through-mask electroplating
掩模电镀
1.
Thickness uniformity of Ni microstructure deposited by through-mask electroplating;
掩模电镀镍微结构的镀层均匀性研究
5) phase-shifting mask
相移掩模
1.
Phase-shifting mask for 100nm node ArF excimer laser lithography;
用于100nm节点ArF准分子激光光刻的相移掩模技术
2.
Process window improvement is presented due to off-axis illumination(OAI) and phase-shifting mask(PSM) for 193 nm immersion lithography at 65 nm node.
研究了交替型相移掩模及离轴照明对65nm分辨率ArF浸没式光刻的影响。
6) mask methods
掩模法
7) Image masking
图象掩模
8) cover module
掩模模板
9) mask technique
掩模工艺
10) masking frame
掩模帧
1.
An algorithm for space target motion trajectory acquisition based on multi-frame addition and creation of background masking frame was put forward.
在深入分析恒星跟踪和目标跟踪两种模式下星敏感器成像特点的基础上,针对星图中空间目标运动轨迹提取算法进行了研究,提出了基于序列图像多帧累加背景掩模帧生成的目标提取算法。
补充资料：掩耳屈首
掩耳屈首 掩耳屈首 导引功法名。方法为：用手掌掩住两耳，伸屈头部数次。《遵生八笺》：“邪风入脑，虚火上攻，则头目昏旋，偏正作痛。……以两手掩耳，折头五七次，……以逐其邪，自然风散邪去。”
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条