3) electron beam direct-writing lithography
电子束直写光刻
1.
Patterned media with nickel nanopillar arrays as the magnetic recording units was prepared with electron beam direct-writing lithography and electrodeposition.
以电子束直写光刻图形为模版,采用直流电沉积和数值模拟的方法,研究了镍纳米柱阵列图案化磁记录介质的制备工艺和模版电沉积过程中的沉积不均匀问题。
4) electron beam direct-write exposure
电子束直写曝光
5) electron beam direct writing
电子束直写
1.
Based on the analysis, a new method is presented to fabricate the BSG with electron beam direct writing.
并在此基础上 ,采用电子束直写加工光栅掩模 ,制作取样光栅。
2.
The mold manufacturing is the key part in imprint lithography process, which includes electron beam direct writing, stepping molding, and the conversion from small mold to big mold.
采用电子束直写、步进制模、压印翻制的压印模具生产工艺 ,其模具的制造是目前面临的难点。
6) electron beam lithography
电子束光刻
1.
Principle of electron beam lithography and its application on the nanofabrication and nanodevice;
电子束光刻技术的原理及其在微纳加工与纳米器件制备中的应用
2.
Methods of proximity effect correction in electron beam lithography;
电子束光刻中邻近效应校正的几种方法
3.
Application of chemically amplified resists in electron beam lithography;
化学放大胶在电子束光刻技术中的应用
补充资料：电子束
由阴极射线产生的束状电子流。电子显微镜和电视机就是利用电子束形成影像的。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条