1) Proton beam writing
质子束刻写
1.
Proton beam writing(PBW) is a direct writing technique allowing the creation of three-dimensional structures with a high aspect ratio in the micrometer and nanometer range in photoresist materials without the use of a templates.
在中国科学院上海应用物理研究所的扫描质子微探针装置上,研制了图形化扫描器,同时研究了适合质子束刻写的光刻胶制备、显影、定影技术。
2) electron beam direct-writing lithography
电子束直写光刻
1.
Patterned media with nickel nanopillar arrays as the magnetic recording units was prepared with electron beam direct-writing lithography and electrodeposition.
以电子束直写光刻图形为模版,采用直流电沉积和数值模拟的方法,研究了镍纳米柱阵列图案化磁记录介质的制备工艺和模版电沉积过程中的沉积不均匀问题。
5) writing beam
写电子束
6) ion beam etching
离子束刻蚀
1.
Influence of fabrication error in ion beam etching on diffractive optical element;
离子束刻蚀工艺误差对DOE器件的影响
2.
Fresnel lens fabricated by ion beam etching;
离子束刻蚀法制作菲涅耳透镜
3.
An Ion beam etching facility,model KZ-400 has been successfully designed and constructed to fabricate large-aperture(400 mm×400 mm) optical diffraction components.
日前我室为制作大口径(400 mm×400 mm)衍射光学元件需要,成功研制了一台KZ-400离子束刻蚀装置。
补充资料：电子束
由阴极射线产生的束状电子流。电子显微镜和电视机就是利用电子束形成影像的。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条