1) reactive sputtering equipment
反应溅射设备
3) Reactive sputtering
反应溅射
1.
Microstructure and mechanical properties of Ti-Al-Si-N nanocrystalline composite films prepared by the reactive sputtering method;
反应溅射Ti-Al-Si-N纳米晶复合薄膜的微结构与力学性能
2.
Microstructure and mechanical properties of(Al,Ti)(O,N) coatings synthesized by reactive sputtering;
反应溅射(Al,Ti)(O,N)涂层的微结构与力学性能
3.
On-line continuous deposition of SiO_2 by medium frequency reactive sputtering and ITO by direct current sputtering;
中频反应溅射SiO_2膜与直流溅射ITO膜的在线联镀
5) RF actively sputtering technique
RF反应溅射
1.
Highly oriented and transparent polycrystalline ZnO films prepared by RF actively sputtering technique;
RF反应溅射法制备高度取向生长的透明多晶ZnO薄膜
6) reactive co-sputtering
共反应溅射
1.
A new gate dielectric material,HfTiON,is deposited by reactive co-sputtering of Hf and Ti targets in N2/O2 ambient,followed by anneal in N2 at 600 °C and 800 °C respectively for 2 mins.
在N2/O2气氛中,使用Ti、Hf靶共反应溅射在衬底Si上淀积一种新型栅介质材料HfTiON,随后分别在N2气氛中600°C和800°C退火2min。
补充资料：三级反应溅射
分子式：
分子量：
CAS号：
性质：见阴极溅射。
分子量：
CAS号：
性质：见阴极溅射。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条