1) (TiMe)N hard coatings
(TiMe) N 硬质薄膜
2) TrueTime
True Time
1.
Simuliation was made with real-time simulation software(packet) TrueTime based on Matlab/Simulink.
文章结合网络调度和系统控制,以网络的可调度性和系统稳定性为约束条件,给出了NCS的性能优化模型,并利用基于Matlab/Simulink的实时控制系统仿真软件包True Time对其进行了仿真。
3) (TiNb)N coating
(TiNb)N薄膜
4) Fe-N thin films
Fe-N薄膜
1.
Effects of substrate temperature on structure,morphology and magnetic properties of Fe-N thin films;
衬底温度对Fe-N薄膜结构、形貌及磁性能的影响
2.
Effect of bias voltage on the structure and properties of Fe-N thin films prepared by direction current magnetron sputtering;
偏压对直流磁控溅射Fe-N薄膜结构及性能的影响
3.
The Fe-N thin films were deposited on single crystal NaCl(100) and glass substrates via DC magnetron sputtering with an Ar/N2 gas mixture(N2/(Ar+N2)=10%) as the discharging gas.
采用直流磁控溅射方法,以Ar/N2为放电气体(N2/(Ar+N2)=10%),在玻璃和NaCl(100)单晶片上分别沉积获得Fe-N薄膜样品。
5) Cr-N film
Cr-N薄膜
1.
Study of the oxidation resistance of Cr-N film;
Cr-N薄膜抗氧化性能的研究
2.
Cr-N films are deposited in this equipment, the influences of deposition parameters on the structure and properties of the films are analyzed, such as the ratio of gas (N2 and Ar),.
分析结果表明,Cr-N薄膜显著提高了基体的显微硬度和耐磨性,Cr-N薄膜硬度是基底硬度的4-8倍。
6) (TiTa)N coating
(TiTa)N薄膜
补充资料：atomization time
分子式：
CAS号：
性质：石墨炉原子吸收光谱分析原子化阶段所选定的时间。该时间应尽可能短，约2～5s；否则将缩短石墨管使用寿命。
CAS号：
性质：石墨炉原子吸收光谱分析原子化阶段所选定的时间。该时间应尽可能短，约2～5s；否则将缩短石墨管使用寿命。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条