Growth and characterization of aluminum nitride films by penning-type discharge plasma sputtering process;

Application of Penning discharge in vacuum measuring of sealed vacuum device;

According to the mechanism of the Penning discharge,deduce the theoretical formula of an ion pumps pumping speed,discuss the dependence of the pumping speed on several discharge parameters,and calculate the pumping speed for N 2 or CO.

As a sputter-ion pump,the titanium getter pump can cause Penning discharge under the action of high voltage and high-intensity magnetic field to adsorb the gas molecules in a container so as to acquire vacuum.

the high-temperature thermal ion source, arc discharge ion source and Penning ion source, have been developed for optimal ion beam of different radioactive isotopes.