A new generation of positron beams in the form of trap-based beam sources has been developed by positron trapping, confinement and accumulation in a Penning trap.

A particle in cell code has been developed to simulate the steady state of electron plasmas in an electron beam Penning trap and to study its scaling law.

By meansofinjecting an electron beam with low canonicalangularmomentum in to a Penning trap,electron plasma with a dense core is confined in thedevice.

Growth and characterization of aluminum nitride films by penning-type discharge plasma sputtering process;

Application of Penning discharge in vacuum measuring of sealed vacuum device;

According to the mechanism of the Penning discharge,deduce the theoretical formula of an ion pumps pumping speed,discuss the dependence of the pumping speed on several discharge parameters,and calculate the pumping speed for N 2 or CO.

As a sputter-ion pump,the titanium getter pump can cause Penning discharge under the action of high voltage and high-intensity magnetic field to adsorb the gas molecules in a container so as to acquire vacuum.

Numerical calculation was performed with this model for the case of Ne+Xe Penning gas mixture to evaluate possible influence of Xe percentage on the working voltage and the UV production efficiency in the discharge.

In this paper, the VUV radiant characteristics of three Penning gases and the light emitting characteristics of seven VUV phosphors are compared and they are chosen to apply in ACPDP.