1) bulk target
块状靶材
1.
The plasma characteristics of the bulk target irradiated by pulse laser is studied in detail, and the theoretical model of pulsed laser driven ablation is set up accordingly.
利用质量连续性、动量守恒和能量守恒这三个基本方程 ,研究高能脉冲激光照射块状靶材产生等离子体的物理特性。
2) bulk media
块状材料
1.
The propagation of linearly and circularly polarized high-intensity femtosecond laser pulses in bulk media is experimentally investigated.
实验研究了线偏振和圆偏振状态下的飞秒强激光脉冲在块状材料中的传输过程。
2.
The pulse spectrum broadening and dispersion compensation compression phenomenon when focusing the laser pulse into bulk media are experimentally investigated.
26 mJ,脉宽50 fs的激光脉冲经透镜在空气中聚焦后再入射到块状材料上,出射脉冲光谱被展宽到接近40 nm。
3) Target
[英]['tɑ:ɡɪt] [美]['tɑrgɪt]
靶材
1.
Study on the yellow spots defect of ZnS-SiO_2 ceramic target;
ZnS-SiO_2陶瓷靶材中黄点缺陷的研究
2.
Preparation and electric properties of the Ba_(0.7)Sr_(0.3)TiO_3 ceramic target;
Ba_(0.7)Sr_(0.3)TiO_3陶瓷靶材的制备工艺及电性能研究
4) target material
靶材
1.
Properties and microstructure of Cr-Si target material manufactured by Hot Isostatic Press;
热等静压Cr-Si靶材的特性及微结构研究
2.
Microstructure and properties of nanocrystalline copper target material prepared by flow-levitation-molding method;
纳米金属铜靶材的微结构与性能
5) targets
[英]['tɑ:git] [美]['tɑrgɪt]
靶材
1.
The basic principle of sputtering was presented, and the targets and techniques used in the preparation of titania thin film from sputtering were reviewed and discussed.
介绍了溅射法镀膜的基本原理,阐述了溅射法镀二氧化钛薄膜用靶材及相应溅射镀膜工艺的研究现状。
2.
The main fields where targets are applied are silicon chip, FPD and memory technology.
介绍了全球靶材市场的概况和靶材的发展趋势。
3.
8)ferrite targets were prepared by solid state reaction method, then the effects of Ni content on the properties of NiZn targets were investigated.
首先采用固相反应法制备NixZn1-xFe2O4铁氧体靶材(x=0。
6) target materials
靶材
1.
Manufacture and application of sputtering target materials;
溅射靶材的应用及制备初探
2.
The demand for sputtering target materials are increased with the rapid development of the electronic and information industries in the world.
随着电子及信息产业突飞猛进的发展,世界溅射靶材的需求量越来越大。
3.
The superconducting target materials which are the sputtering source of thin films are very important to preparing high grade superconducting thin films.
高温超导材料在弱电和强电领域中的应用前景都非常美好，超导薄膜可在以薄膜为基础的微电子学器件上首先突破应用，而超导靶材是制备超导薄膜的溅射源，靶材质量的优劣直接影响超导薄膜的质量和应用。
补充资料：靶扫描和靶重建
靶扫描和靶重建
影像学术语。CT检查中，对扫描野(SFOV)中某一兴趣区扫描时行较大矩阵重建的方式称靶扫描。在扫描及影像重建完成后，对显示野(DFOV)中某一兴趣区重新进行较大矩阵重建成像的方式称靶重建。前者是直接利用扫描野中兴趣区的较大量的原始数据进行影像重建，后者则是利用常规扫描中采集的原始数据进行兴趣区的影像重建。两种技术实现的基本前提都是一次扫描所获得的投影测量数据必须能够满足兴趣区影像重建矩阵所需的信息量。靶扫描在扫描前预先设定兴趣区，成像后不储存非兴趣区原始数据；靶重建则需储存层面扫描所获得的全部原始数据，占用较多的磁盘空间，但以后可在图像中任选兴趣区进行局部重建。两种技术在成像效果(空间分辨率，对比分辨率)上是一致的，这与单纯的局部图像放大(zoom)不同。后者没有增加兴趣区内像素数量，虽使影像扩大但分辨率并未提高，清晰度反有下降。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条