1.
Researches of Yellow Spots Defect on ZnS-SiO_2 Ceramic Target Material;
ZnS-SiO_2陶瓷靶材黄点缺陷的研究
2.
Pulsed Laser Ablation and Target Optical Characteristic Investigation;
脉冲激光烧蚀及靶材光学性质的研究
3.
Study of Preparation of Polycrystalline Material of La_(0.5)Sr_(0.5)CoO_3;
La_(0.5)Sr_(0.5)CoO_3多晶靶材制备工艺的研究
4.
Research on the fabricating techniques of the BaAl_2S_4:Eu sputtering targets
硫代铝酸钡(BaAl_2S_4:Eu)靶材制备工艺研究
5.
Study on Effect of Doping Content on the Performance of ZnO Ceramic Target
掺杂量对ZnO陶瓷靶材性能影响的研究
6.
Comparison among depths of penetration of different targets subjected to rigid projectile impact
刚性弹侵彻不同靶材的侵彻深度比较
7.
Modification Projiect of the Terminal Electrode in HI-13 Tandem Accelerator and Investigation of Target Materials for Target-Source of ISOL;
串列加速器头部电极改进方案及ISOL靶—源中靶材料的研究
8.
As a powerful pulsed laser irradiate a solid material, the plasmas layer of high-temperature and high-pressure would be formed in the incident surface of target instantaneously.
脉冲强激光辐照固体靶材时，瞬间即可在靶材辐照面形成一个高温高压的等离子体层。
9.
: mainly used in ITO target, alloy and photoelectricity components.
主要用于制作ITO靶材、合金及光电元器件等。
10.
Numerical Study on Interaction of Intense Pulsed Ion Beam and Target;
强流脉冲离子束与靶材相互作用的数值研究
11.
Study of Impulse Coupling with Materials by Pulsed XeCl Excimer Laser;
脉冲XeCl准分子激光与靶材冲量耦合研究
12.
Research on Manufacture of AZO Transparent Conductive Oxide Targets and Its Films
AZO透明导电氧化物靶材及其薄膜制备的研究
13.
Development of fabrication technology of the CuInGaSe_2 thin film and its sputtering target
CuInGaSe_2太阳能薄膜及其靶材制备技术发展与前景
14.
Measurements of Impulse Coupling Coefficient of Micro-laser Ablate Propulsion
激光微烧蚀靶材的冲量耦合系数测量方法
15.
Low-temperature Nonpressurized Sintering and Performance of High-purity Er_2O_3 Target Material
高纯Er_2O_3靶材的低温无压烧结及性能研究
16.
ZrW_2O_8/ZrO_2 Film Growth and Its Composite Target Fabrication
脉冲激光沉积ZrW_2O_8/ZrO_2复合薄膜及其靶材制备
17.
The Study of Recovering Metal Indium from the ITO Target
从ITO靶材废料中回收提取金属铟工艺的研究
18.
Investigation on Preparation of the Target for Metal Film Resistor with High Resistance
金属膜电阻器用高阻靶材制备工艺研究