XRD,Nano indenter and profiler were employed to investigate the influence of the TaN target on microstructure,mechanical properties of the coatings.

Study on the yellow spots defect of ZnS-SiO_2 ceramic target;

Preparation and electric properties of the Ba_(0.7)Sr_(0.3)TiO_3 ceramic target;

Properties and microstructure of Cr-Si target material manufactured by Hot Isostatic Press;

Microstructure and properties of nanocrystalline copper target material prepared by flow-levitation-molding method;

The basic principle of sputtering was presented, and the targets and techniques used in the preparation of titania thin film from sputtering were reviewed and discussed.

The main fields where targets are applied are silicon chip, FPD and memory technology.

8)ferrite targets were prepared by solid state reaction method, then the effects of Ni content on the properties of NiZn targets were investigated.

Manufacture and application of sputtering target materials;

The demand for sputtering target materials are increased with the rapid development of the electronic and information industries in the world.

The superconducting target materials which are the sputtering source of thin films are very important to preparing high grade superconducting thin films.