1) UV uniform exposure
紫外均匀曝光
1.
UV uniform exposure can effectively vary the coupling characteristics of the annealed long period gratings (LPGs) in hydrogen loaded fiber.
写于载氢光纤上的长周期光纤光栅经过高温退火后 ,对其进行紫外均匀曝光能够有效改变其耦合特性。
2) uniform UV exposure
均匀紫外曝光
1.
It is pointed out both in aspects of theory and experiment that if the solubility of H 2 in the hydrogen-loaded fiber is lowered and using the technique of uniform UV exposure properly, the thermal stability of LPFG could be improved greatly.
从理论和实验两个方面指出了在长周期光纤光栅的制作过程中若适当地降低长周期光纤光栅的含氢量 ,并灵活地运用均匀紫外曝光技术 ,能够明显地提高长周期光纤光栅的热稳定
3) UV exposure
紫外曝光
1.
A technique for trimming the Bragg gratings by the UV exposure is proposed.
制作了基于B Ge光纤的Bragg光栅,并且提出对光栅进行紫外曝光修整的处理方法。
4) exposition uniformity
曝光均匀性
1.
The exposition uniformity and the time stability of the hologram recorded in the photopolymer are studied in experiments,also the effects of isopropanol and drying of hot wind.
本文介绍了红敏光聚合物干板在学生全息实验中的使用情况,实验测定了该干板的曝光均匀性、全息图的稳定性以及异丙醇溶液和热风吹干的作用。
5) deep UV lithography
深紫外曝光
1.
Photonic crystals and waveguide devices suitable for 248 nm deep UV lithography and 0.
在大量计算和优化的基础上,设计了适于248nm深紫外曝光和0。
6) ultraviolet exposure
紫外线曝光
补充资料：比色分析法(见紫外—可见分光光度法)
比色分析法(见紫外—可见分光光度法)
比色分析法见萦外一可见分光光度法。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条