1)  polishing liquid
抛光浆
2)  slurry
抛光浆料
1.
The polishing slurry with smaller abrasive and polishing technology effectively can reduce the roughness and thickness of the damaged layer and also afford high polishing rate(200nm/min).
以化学机械全局平面化(CMP)动力学过程和机理为基础,在抛光浆料中采用粒径为1 5～20nm的硅溶胶作为CMP磨料,保证了高的抛光速率(200nm/min),同时可有效降低表面粗糙度,减少损伤层的厚度。
2.
The component of CMP slurry was researched.
对目前超大规模集成电路钨插塞化学机械全局平面化(CMP)的原理及工艺进行了分析,对钨抛光浆料的组成成分进行了研究,开发了一种能够适合工业生产的钨的碱性抛光浆料,并对钨抛光浆料今后的发展进行了展望。
3)  polishing
抛光
1.
Study of mechanical polishing of CVD diamond thick films;
CVD金刚石厚膜的机械抛光研究
4)  polish
抛光
1.
Development of the Rotator Special for Autoclave Body Polish;
釜体抛光专用转罐机的研制
2.
The Design of a Self-oscillating Abrasive Water Jet Polisher of Economy Type;
经济型自激振荡磨料射流抛光机设计
3.
The design of the grinding liquid pulse shot flow polisher;
磨液脉冲射流抛光机设计
5)  lapping
抛光
1.
Ultrasonic is applied in slider lapping.
在硬盘磁头抛光中加入超声波,可以提高材料去除率、降低表面粗糙度值、减小极尖沉降。
2.
The thickness of the slurry film in one lapping process with a kind of texturing plate surface was calculated as an example.
根据运动学分析,研究了磁头和抛光盘接触面之间速度场的分布;结合流体力学理论,将抛光盘表面的沟槽视为楔形滑块或阶梯轴承,研究了磁头和抛光盘接触面之间抛光液的流动行为。
3.
It is a contradiction to achieve a high material removal rate and a super smooth surface in lapping of magnetic head.
同时获得高去除率和超光滑平整的表面是硬盘磁头自由磨粒抛光的矛盾,研究自由磨粒抛光材料去除规律可以优化抛光工艺。
6)  polishing machine
抛光机
1.
Improving of optical polishing machine based on fuzzy control;
基于模糊控制技术的光学抛光机床的改造
2.
According to the analysis of the structure of polishing pad,polishing machine and polishing slurry,the merits of fixed abrasives (FA)CMP were presented.
经过对传统化学机械抛光技术的研究与分析,指出了目前ULSI制造中使用的传统化学机械抛光技术的缺点,通过对固结磨料化学机械抛光中的抛光垫结构、抛光机原理及抛光液的分析,得出了固结磨料化学机械抛光技术的优点,同时还对硅片固结磨料化学机械抛光的缺陷进行了研究。
3.
The tradition optical lens polishing machine existence main axle swinging inertia is big, the rack easy to have the vibration, the complete machine stability inferior serious influence product precision question.
传统光学透镜抛光机存在主轴摆动惯性大,机架易产生振动,整机稳定性差等严重影响产品精度的问题。
参考词条
补充资料：抛光剂,抛光混合剂
CAS：68909-13-7
中文名称：焙烧提浓的氟碳铈镧矿；抛光剂,抛光混合剂
英文名称：Bastnaesite, calcined concentrate；Calcined bastnasite；bastnaesite, calcined conc.；polishing compound；Bastnaesite,calcined concentrate
说明：补充资料仅用于学习参考，请勿用于其它任何用途。