1) etching parameter
蚀刻参数
1.
The optimizing methods of main etching parameters, such as etching rate, uniformity and selectivity, were investigated by the orthogonal experiment, and these results can be used for setting main process parameters, adjusting them with a drifting from desired conditions, and optimizing etchings electivity.
阐述了二氧化硅干法蚀刻的原理和主要的蚀刻参数。
2) etching function
刻蚀函数
3) etching factor
蚀刻系数
4) scale parameter
刻度参数
1.
We employ the Bayes empirical Bayes (EB) procedure to estimate the scale parameter in a special exponential family,and prove that the Bayes EB estimator of the scale parameter converges almost surely (a.
我们采用贝叶斯经验贝叶斯方法估计了一个特殊的指数分布族中的刻度参数,证明了刻度参数的贝叶斯经验贝叶斯估计几乎处处收敛到它的贝叶斯估计且获得了它的渐近最优性。
2.
By means of the parameter estimation,we give the Bayesian estimation,the minimum risk equivalent estimation and the minimax estimation of scale parameter σ under the q-symmetric entropy loss function in the normal distribution,its mean of which is 0.
用参数估计的方法,研究均值为0的正态分布中刻度参数在q对称熵损失函数下的最小风险同变估计、Bayes估计和M inimax估计,并讨论了[cT+d]1/2形式的估计量当0≤c0;c=c*,d≥0时是可容许的,当0c*,d>0时是不可容许的。
3.
The present paper deals with the minimum risk equivelent estimator and Bayes estimator for the scale parameter of exponential distribution under the symmetric entropy loss, and discusses the admissibility and inadmissibility of estimator with the form of (cT+d)-1.
研究指数分布的刻度参数在对称熵损失下的最小风险同变估计及Bayes估计，并讨论（cT＋d）－1形式估计的可容许性与不可容许性。
5) parameters of groove
刻槽参数
补充资料：光蚀刻
光蚀刻
photoetching
简称光刻。利用照相手段制作抗蚀膜像，用来保护表面，在金属、塑料等上面，借助腐蚀剂进行腐蚀的方法。应用于制作印片或电器的线路板等。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条