1) Ar pressure
氩气分压
1.
Effect of Ar pressure and film thickness on the microstructure and stress properties of Al films;
氩气分压与膜厚对溅射Al膜微结构及应力的影响
2.
Al films, grown on Si wafers by DC magnetron sputtering, were studied with X-ray diffraction and optical phase-shift technology at different Ar pressures.
在不同氩气分压下,用直流溅射法在室温Si基片上制备了不同厚度的Al膜。
2) Argon pressure
氩气压
1.
The Influence of sputtereing argon pressure and power on the properties of DyFeCo amorphous film are discussed.
本文采用射频磁控溅射方法制备了ＤｙＦｅＣｏ非晶磁光薄膜，研究了氩气压，溅射功率对ＤｙＦｅＣｏ薄膜性能的影响，实验表明：反射率随氩气压升高而降低，矫顽力随氩气压升高而逐渐增大，达到一定值时克尔回线反向，随后矫顽力又逐渐减少，高气压下的矫顽力温度特性较低气压下的矫顽力温度特性要好，但氩气压进一步升高，磁光克尔回线矩形度变差，本征磁光克尔角随氩气压升高而增大，到达最大值后又逐渐减少。
3) argon atmosphere at reduced pressure
减压氩气
1.
Influence of matrices on electron temperature of laser micro-plasma in argon atmosphere at reduced pressure;
减压氩气下基体对激光微等离子体电子温度的影响
4) argon gas distribution
氩气分布
5) argon partial pressure
氩分压
1.
This paper has discussed the structure and photoelectric properites of films dependence of sputtering argon partial pressure.
本文重点讨论了溅射氩分压对薄膜的结构和光电特性的影响 ,合适的氩分压为 0 。
补充资料：电容分压器(见分压器)
电容分压器(见分压器)
capacitor voltage dividers
d)onf。日g无en丫oq{电容分压器(eaPaeitor voltage dividers)见分压器。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条