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1)  Si-based OEIC
硅基光电子集成
2)  silicon-based photonics integration
硅基光子集成
3)  Si optoelectronic integration
Si基光电子集成
4)  optoelectronic integration
光电子集成
1.
Silicon based light emitting materials are the elemental materials for the future optoelectronic integration.
硅基发光材料是未来光电子集成的基础材料。
2.
The development of GaN material and its optoelectronic devices is one of the hot spots on optoelectronic research fields in recent years, and wafer bonding technology is an attractive fabrication method which has the potential for achieving desirable optoelectronic integration.
 GaN材料及其有关光电子器件的研制是近年来光电子研究领域内的研究热点之一,而键合技术又是光电子集成研究领域内一项新的制作工艺。
3.
Silicon is a fundamental material for microelectronics, but Si-based light-emitting materials are necessary for developing optoelectronic integration.
为了发展光电子集成就必须研究硅基发光材料。
5)  OEIC
光电子集成
6)  Si-substrate integrated circuit
硅基集成电路
1.
Development of Si-substrate integrated circuits and new generation dielectric oxide materials for MOS gates;
硅基集成电路的发展和新一代栅极氧化物材料的研究现状
补充资料:9-三甲硅基-6-[(三甲硅基)氧]基-9H-嘌呤
CAS: 17962-89-9
分子式: C11H20N4OSi2

中文名称: 9-三甲硅基-6-[(三甲硅基)氧]基-9H-嘌呤

英文名称: 9-(trimethylsilyl)-6-[(trimethylsilyl)oxy]-9H-Purine
O6,9-bis(Trimethylsilyl) hypoxanthine
9-(trimethylsilyl)-6-[(trimethylsilyl)oxy]-9h-purin
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
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