1) a C:F
氟化非晶态碳膜
1.
Amorphous fluorinated carbon(a C∶F) films were grown on Si(100) substrate with plasma immersion ion implantation(PIII) in a mixture of CH 4 and CF 4 gases to study the influence of substrate bias voltage on various properties of the film,including its microstructures,its nano hardness and its hydrophobic properties.
为了研究基体负的低偏压Vb 对氟化非晶态碳膜的结构、纳米硬度和疏水性能的影响 ,采用等离子体浸没与离子注入装置 ,CF4和CH4作为气源 ,在不同的基体偏压下制备了一系列氟化非晶态碳膜。
2) fluorinated amorphous carbon film
氟化非晶碳薄膜
1.
As one of promising interlay dielectrics used in the future ULSI, fluorinated amorphous carbon film (a-C: F) has been attracted intensively.
利用静电探针和光强标定的发射光谱(AOES)研究了CHF_3、CHF_3／C_6H_6气体ECR放电等离子体的特性及氟化非晶碳薄膜(a-C：F)的结构与等离子体空间基团分布的关系。
3) fluorinated amorphous carbon film
氟化非晶碳膜
1.
Relationship between thermal stabilty and optical bandgap of fluorinated amorphous carbon films;
通过傅里叶变换红外吸收谱和紫外 可见光谱获得了薄膜中CC双键的相对含量和光学带隙 ,发现膜中CC键含量与光学带隙之间存在着密切的关联 ,在高微波功率下沉积的氟化非晶碳膜具有低的光学带隙和较好的热稳定性 。
4) a_-C:F:N films
氮掺杂氟化非晶碳薄膜
5) fluorinated amorphous hydrocarbon film
氟化非晶碳氢薄膜
1.
Infrared structure and electrical characteristics of the fluorinated amorphous hydrocarbon film;
氟化非晶碳氢薄膜的红外结构及其电学特性
6) fluorinated amorphous carbon
氟化非晶碳
1.
Low-dielectric-constant fluorinated amorphous carbon films prepared by ECR-CVD;
ECR-CVD制备氟化非晶碳低k介质薄膜
补充资料：氟化
见卤化。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条