1) polishing parameter
抛光参数
1.
A study on electrolytic polishing parameter for preparation of osmatic metal film sample in electrolytic polishing liquid of 0.
使用０４６ｍｏｌ／ＬＨＣｌＯ４１６７ｍｏｌ／ＬＨＡｃ电解抛光溶液进行实验，确定了常温下制取渗金属薄膜样品的电解抛光参数，为Ｂｏｌｍａｎｎ法制取电镜用薄膜样品提供了电解参数选择方法。
2) Computer controlled optical polishing
数控抛光
1.
Removing function of polishing pad in computer controlled optical polishing;
数控抛光技术中抛光盘的去除函数
3) computer controlled polishing
数控抛光
1.
Analog computing and analysis of computer controlled polishing for the square workpiece;
方形工件的数控抛光模拟计算与分析
4) NC polishing
数控抛光
1.
Study on NC Polishing Technology of Complex Helical Curved Face;
螺旋复杂曲面数控抛光技术的研究
2.
Based on current situation that the finished screw couldn t meet the application requirement,this paper did research on the technique of helical surfcace NC polishing.
针对目前国内螺旋曲面螺杆抛光后其表面粗糙度不能很好地满足实际需要的现状,对螺旋曲线的数控抛光技术进行了研究。
5) Polishing Powder Parameter
抛光粉的参量
补充资料：抛光剂,抛光混合剂
CAS：68909-13-7
中文名称：焙烧提浓的氟碳铈镧矿；抛光剂,抛光混合剂
英文名称：Bastnaesite, calcined concentrate；Calcined bastnasite；bastnaesite, calcined conc.；polishing compound；Bastnaesite,calcined concentrate
中文名称：焙烧提浓的氟碳铈镧矿；抛光剂,抛光混合剂
英文名称：Bastnaesite, calcined concentrate；Calcined bastnasite；bastnaesite, calcined conc.；polishing compound；Bastnaesite,calcined concentrate
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参考词条