1) (Fe,Co)-N thin film
(Fe,Co)-N薄膜
2) Co/Co-Fe thin film
Co/Co-Fe薄膜
3) Co-N thin films
Co-N薄膜
1.
Co-N thin films are mainly used in the field of high-density magnetic recording.
本论文以Ar和N2为放电气体,用直流磁控溅射方法在Si(111)基底上制备了Co-N薄膜,并对其进行了一系列表征:用X射线衍射(XRD)和选区电子衍射(SAED)对薄膜的结构进行了分析;用扫描电镜(SEM)确定了薄膜厚度并获得了薄膜的表面形貌;用超导量子干涉仪(SQUIDS)对薄膜的磁性进行了分析。
4) Ni-Fe/Co-Fe thin film
Ni-Fe/Co-Fe薄膜
5) Fe-N thin films
Fe-N薄膜
1.
Effects of substrate temperature on structure,morphology and magnetic properties of Fe-N thin films;
衬底温度对Fe-N薄膜结构、形貌及磁性能的影响
2.
Effect of bias voltage on the structure and properties of Fe-N thin films prepared by direction current magnetron sputtering;
偏压对直流磁控溅射Fe-N薄膜结构及性能的影响
3.
The Fe-N thin films were deposited on single crystal NaCl(100) and glass substrates via DC magnetron sputtering with an Ar/N2 gas mixture(N2/(Ar+N2)=10%) as the discharging gas.
采用直流磁控溅射方法,以Ar/N2为放电气体(N2/(Ar+N2)=10%),在玻璃和NaCl(100)单晶片上分别沉积获得Fe-N薄膜样品。
6) Fe-N films
Fe-N 薄膜
1.
The effect of nitrogen partial pressure on the structures and magnetic properties of Fe-N films was investigat.
Fe-N 薄膜因其具有高饱和磁化强度、低矫顽力,有望获得较高的微波磁导率,而在集成化微磁器件、抗电磁干扰以及新型雷达波吸收材料研究中受到广泛和高度的重视。
2.
The effects of preparation conditions on the structures andmagnetic properties of Fe-N films and the relation between the saturationmagnetization and film thickness were investigated in detail.
采用射频磁控溅射法制备了具有高饱和磁化强度的 Fe-N 薄膜。
补充资料：(betab-5-11)-iron carbonyl (fe(co)5
CAS：13463-40-6
分子式：C5FeO5
分子质量：195.90
中文名称：五羰基铁
英文名称：fer pentacarbonyle；fer pentacarbonyle (french)；iron carbonyl；( betab-5-11)-iron carbonyl (fe(co)5；iron carbonyl (fe(co)5), (tb-5-11)；iron carbonyl compounds；iron carbonyl fe(co)5；pentacarbonyl-iro；iron pentacarbonyl(as fe)；iron,pentacarbonyl-
分子式：C5FeO5
分子质量：195.90
中文名称：五羰基铁
英文名称：fer pentacarbonyle；fer pentacarbonyle (french)；iron carbonyl；( betab-5-11)-iron carbonyl (fe(co)5；iron carbonyl (fe(co)5), (tb-5-11)；iron carbonyl compounds；iron carbonyl fe(co)5；pentacarbonyl-iro；iron pentacarbonyl(as fe)；iron,pentacarbonyl-
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参考词条