1) MPCVD
微波等离子化学气相沉积
1.
Deposition of Diamond Film on Silicon Nitride Tools by MPCVD;
微波等离子化学气相沉积金刚石膜涂层氮化硅刀具(英文)
2.
High quality and high adhesion diamond coatings was obtained by MPCVD(microwave plasma chemical vapor deposition) method on the WC - 12% Co substrate which had been pretreated by two-step etching method.
通过采用二步浸蚀法对硬质合金(WC—Co12％)刀具进行预处理,应用微波等离子化学气相沉积装置,在经二步浸蚀法预处理过的硬质合金上沉积出高质量和结合力强的金刚石涂层。
3.
The diamond coating with high quality and good adhesion was obtained by a MPCVD method on the WC-12%Co substrate which was pretreated by a two-steps method.
通过采用二步浸蚀法对硬质合金 (WC— 12 %Co)刀具进行预处理 ,应用微波等离子化学气相沉积装置 ,在经二步浸蚀法预处理过的硬质合金上沉积出高质量和结合力强的金刚石涂层。
2) MPCVD
微波等离子体化学气相沉积
1.
SiC NANOWIRES GROWN ON SILICON(100) WAFER BY MPCVD METHOD;
微波等离子体化学气相沉积方法在Si衬底上生长SiC纳米线
2.
Chain-like carbon nanotube(CNTs) thin films were rapidly deposited on Ti-coated Al2O3 substrate by MPCVD(microwave plasma enhanced chemical vapor deposition) process for only 1min with CH4 and H2 as reaction gases.
以镀有Ti层的Al2O3为衬底,在微波等离子体化学气相沉积系统中,以CH4和H2为反应气体,快速制备了链状碳纳米管薄膜(沉积时间仅1 min)。
3.
C3N4 thin films have been prepared on Pt substrates by microwave plasma chemical vapor deposition (MPCVD) method.
采用微波等离子体化学气相沉积法（MPCVD），使用高纯N2（99。
3) microwave plasma chemical vapor deposition
微波等离子体化学气相沉积
1.
Using microwave plasma chemical vapor deposition technology,diamond films were deposited on the silicon wafer of 51~76 mm in diameter.
利用自行设计微波等离子体化学气相沉积装置在直径51 mm和76 mm硅片上制备金刚石薄膜。
2.
A diamond film deposited on hard-metal was obtained by microwave plasma chemical vapor deposition of a methan-hydrogen-oxygen gas mixture.
采用ＣＨ＿４－Ｈ＿２－Ｏ＿２微波等离子体化学气相沉积法在硬质合金表面沉积金刚石薄膜，研究了ＴｉＣ中间过渡层对金刚石薄膜沉积效果的作用及粘结机理。
3.
The globe-like diamond microcrystalline aggregates were fabricated by microwave plasma chemical vapor deposition (MPCVD) method.
在覆盖金属钛层的陶瓷上,利用微波等离子体化学气相沉积(MPCVD)法制备出类球状微米金刚石聚晶膜。
4) microwave plasma chemical vapor deposition
微波等离子体化学气相沉积法
1.
In this paper,carbon nanotubes electrodes are directly synthesized on the surface of electrodes substrate through microwave plasma chemical vapor deposition,then they are disposed by air plasma.
利用微波等离子体化学气相沉积法制备了与电极基底结合良好的纳米碳管电极,用空气等离子体将该纳米碳管电极功能化,并以功能化的电极为工作电极,利用循环伏安法对毒性很强的酚的混合物进行检测。
2.
Under the assistant effect of sulfur, carbon nanotubes electrodes were prepared on the end of tungsten strings directly through microwave plasma chemical vapor deposition.
基于此目的,本研究直接利用微波等离子体化学气相沉积法在钨丝截面上制备出了纳米碳管电极,利用该电极对酸性溶液中的Cu2+进行了检测,并与具有相同截面积的石墨电极的电化学检测性能作了比较,分析了在相同工艺条件下获得的不同纳米碳管电极的电化学检测性能的均一性、稳定性和重现性。
3.
Under the catalytic effect of nickel particles, spring-like carbon filaments were synthesized through microwave plasma chemical vapor deposition.
以镍为催化剂,利用微波等离子体化学气相沉积法制备了弹簧状碳纤维。
5) microwave plasma CVD
微波等离子体化学气相沉积
1.
In this paper, carbon nanotubes (CNTs) are synthesized by microwave plasma CVD directly from an inexpensive raw material source, ilmenite.
以廉价钛铁矿为原料,利用微波等离子体化学气相沉积法,直接制备了纳米碳管,并在适当的条件下,同时将其中的钛氧化物碳化而获得纳米碳管碳化钛复合粉体材料。
6) microwave plasma chemical vapor deposition(CVD)
微波等离子体化学气相沉积(CVD)
补充资料：等离子化学
化学化学边缘学科。研究等离子体内的各种化学反应，包括等离子体内粒子间的反应，等离子体与反应器壁以及与置于等离子体内的电极或其他材料间的反应。已渗入到许多基础理论的研究领域以及工农业生产的各个力一而，日益显示出它的重要作用。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条