1) Ta_2O_5/Si thin film
Ta_2O_5/Si薄膜
2) Ta_2O_5 thin film
Ta_2O_5薄膜
1.
In this dissertation, Ta_2O_5 thin film was deposited by DC reactive magnet sputtering and ann.
Ta_2O_5薄膜具有较高的介电常数，低的漏电流密度，高的击穿强度，和传统工艺兼容性好等优良特性。
3) Ta 2O 5 antireflection thin film
Ta_2O_5减反射薄膜
4) Si/Al/Si film
Si/Al/Si薄膜
5) Si/Fe/Si film
Si/Fe/Si薄膜
1.
A sandwich-type Si/Fe/Si film was deposited on Cu foil by magnetron sputtering.
采用磁控溅射法在铜箔集流体上沉积得到了具有“三明治”结构的Si/Fe/Si薄膜。
6) Fe/Si thin film
Fe/Si薄膜
补充资料：arosurf ta 100
CAS: 107-64-2
分子式: C38H80N·Cl
分子量: 551.05
中文名称: N,N-二甲基二-N-1-十八碳氯化胺
英文名称: 1-Octadecanaminium, N,N-dimethyl-N- octadecyl-, chloride；dimethyldioctadecyl-ammoniu chloride；n,n-dimethyl-n-octadecyl-1-octadecanaminiu chloride；aliquat 207；arosurf ta 100；arquad r 40；dimethyldistearylammonium chloride；distearyl dimethylammonium chloride；distearyldimethylammonium chloride
分子式: C38H80N·Cl
分子量: 551.05
中文名称: N,N-二甲基二-N-1-十八碳氯化胺
英文名称: 1-Octadecanaminium, N,N-dimethyl-N- octadecyl-, chloride；dimethyldioctadecyl-ammoniu chloride；n,n-dimethyl-n-octadecyl-1-octadecanaminiu chloride；aliquat 207；arosurf ta 100；arquad r 40；dimethyldistearylammonium chloride；distearyl dimethylammonium chloride；distearyldimethylammonium chloride
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条