2) silica antireflective coatings
SiO_2增透薄
1.
Effect of methyl-functioned on the optical stability of porous silica antireflective coatings;
甲基化对多孔SiO_2增透薄膜光学稳定性能的影响
3) antireflective film
增透膜
1.
Nano-porous SiO2 antireflective film with high-strength was made using dipping-coating technique with ammonia process post treatment by Sol-Gel method.
激光技术的发展对增透膜的要求越来越高。
4) AR coating
增透膜
1.
Preparation and optical properties of SiO_2 AR coating;
SiO_2光学增透膜的制备及光学性能
2.
A new method for AR coating in mass production of traveling wave SOA;
一种适合于大量制备行波SOA增透膜新技术
3.
Based on Jones matrix theory,characteristic of 1/4 wavepalte with one side HR coating and the other side AR coating is analyzed in this paper.
基于光矢量的琼斯矩阵理论 ,分析了单面镀有高反膜 ,另一面镀有增透膜的 1/4波片工作特性。
5) AR coatings
增透膜
1.
Influence of inhomogeneities on the spectral characteristics of AR coatings;
非均匀性对增透膜增透特性的影响
2.
The optical constants suitable for designing and depositing 193nm AR coatings were calculated,and 193nm AR coatings were designed,produced and characterized on the basis of the calculated results.
计算了适用于193nm增透膜设计与制备的基底与薄膜材料的光学常数,并在此基础上对193nm增透膜进行了设计、制备与性能分析。
3.
In addition, the refractive index, the structure of the layers, center wavelength of 633nm and 1 315nm baffle-board, AR coatings and times control method were presented .
先后得到了Ta2O5和SiO2单层薄膜厚度均匀性调控结果以及不同波长处薄膜折射率,并定性地分析比较了离子束溅射和电子束蒸发制备的薄膜结构;制备并测试了633nm,1315nm反射薄膜以及增透膜。
6) antireflection coating
增透膜
1.
Study of single layer inhomogeneous Ge_(1-x)C_x antireflection coating prepared by reactive low voltage ion plating technique;
用低压反应离子镀的方法制备Ge_(1-x)C_x单层非均匀增透膜的研究
2.
Ion beam assisted deposition of infrared wideband antireflection coating on micro optical components used in low temperature;
离子束辅助淀积低温微光学元件红外宽带增透膜
3.
1064,532 nm frequency-doubled antireflection coating was designed on LiB_3O_5(LBO) substrate using vetor addition method.
采用矢量合成法设计了LiB3O5(LBO)晶体上1064 nm,532 nm二倍频增透膜,在1064 nm处的反射率为0。
补充资料：增透膜
见光学薄膜。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条