1) SiO2 antireflective coating
SiO2增透膜
2) ZrO_2/SiO_2 second harmonics anti-reflection films
ZrO2/SiO2非规整倍频增透膜
1.
Four layer,ZrO_2/SiO_2 second harmonics anti-reflection films,designed by means of Macload Software,were grown by e-beam evaporation and ion beam aided deposition on meta-barium borate(β-BaB_2O_4) β-BaB_2O_4 substrate,and then annealed in vacuum.
利用Macload软件对四层ZrO2/SiO2膜系进行优化设计,以β-偏硼酸钡晶体(-βBaB2O4)为基底,采用电子束蒸发方法、离子束辅助沉积技术和真空退火处理,制备出ZrO2/SiO2非规整倍频增透膜,其在波长532 nm和1064 nm处反射率小于0。
3) antireflective film
增透膜
1.
Nano-porous SiO2 antireflective film with high-strength was made using dipping-coating technique with ammonia process post treatment by Sol-Gel method.
激光技术的发展对增透膜的要求越来越高。
5) AR coating
增透膜
1.
Preparation and optical properties of SiO_2 AR coating;
SiO_2光学增透膜的制备及光学性能
2.
A new method for AR coating in mass production of traveling wave SOA;
一种适合于大量制备行波SOA增透膜新技术
3.
Based on Jones matrix theory,characteristic of 1/4 wavepalte with one side HR coating and the other side AR coating is analyzed in this paper.
基于光矢量的琼斯矩阵理论 ,分析了单面镀有高反膜 ,另一面镀有增透膜的 1/4波片工作特性。
6) AR coatings
增透膜
1.
Influence of inhomogeneities on the spectral characteristics of AR coatings;
非均匀性对增透膜增透特性的影响
2.
The optical constants suitable for designing and depositing 193nm AR coatings were calculated,and 193nm AR coatings were designed,produced and characterized on the basis of the calculated results.
计算了适用于193nm增透膜设计与制备的基底与薄膜材料的光学常数,并在此基础上对193nm增透膜进行了设计、制备与性能分析。
3.
In addition, the refractive index, the structure of the layers, center wavelength of 633nm and 1 315nm baffle-board, AR coatings and times control method were presented .
先后得到了Ta2O5和SiO2单层薄膜厚度均匀性调控结果以及不同波长处薄膜折射率,并定性地分析比较了离子束溅射和电子束蒸发制备的薄膜结构;制备并测试了633nm,1315nm反射薄膜以及增透膜。
补充资料：SI
有机硅树脂简称SI，是由三乙氧基硅烷等缩合而成。溶于乙醇、丁醇、醋酸乙酯、丙酮、苯、甲苯、环己酮等。预聚体在低温下能快速固化，固化后的树脂硬度高、耐热、耐磨、耐辐射、耐水、防潮、耐大气老化，低温(-50℃)不脆化。透明度高，可见光透光率90％以上。无毒。
用作酚醛树脂和环氧树脂剂的改性剂，可提高耐热性和耐水性贮存于阴凉、通风、干燥的库房内。
用作酚醛树脂和环氧树脂剂的改性剂，可提高耐热性和耐水性贮存于阴凉、通风、干燥的库房内。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条