1) with no need of etching technology
无刻蚀
1.
A Fe-Al2O3 composite plating deposit was obtained based on non-etching iron dichloride iron plating process with addition of Al2O3 inert particles in ferrous chloride single salt solution (ferrous chloride concentration of 300 ~ 400 g/L) with no need of etching technology.
以二氯化铁无刻蚀电镀工艺为基础,在氯化亚铁单盐(ρ=300~400g/L)中加入Al2O3惰性粒子,制备了Fe–Al2O3复合镀层。
2) resistless lighography
无光刻胶蚀刻
3) Iron plating without anodic etching
无刻蚀镀铁
4) Non-mask etch of n-GaAs
n-GaAs无掩模刻蚀
5) iron electroplating without pre-etching
无刻蚀低温镀铁
1.
Based on a new process of low temperature iron electroplating without pre-etching, We use power supply of asymmetry AC-DC electroplating made by ourselves to carry out iron electroplating and composite electroplating.
本实验采用无刻蚀低温镀铁工艺，使用自行研制的不对称交一直流镀铁电源进行电镀铁和复合电镀铁。
6) contactless lithography
无接触光蚀刻
补充资料：百刻
1.古代用刻漏计时﹐一昼夜分百刻。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条