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1)  ZnO thin film
ZnO薄膜
1.
Research of deposition condition and structural properties of Nd-doped ZnO thin films grown by RF magnetron sputtering;
RF溅射钕掺杂ZnO薄膜工艺与结构研究
2.
Studies on morphology properties of ZnO thin films deposited on Si(111) substrate;
硅基ZnO薄膜组织形貌的研究
3.
Structure and stress distribution properties of ZnO thin films prepared by RF magnetron sputtering;
射频磁控溅射ZnO薄膜的结构和应力特性
2)  ZnO thin films
ZnO薄膜
1.
Study on structure and optical properties of ZnO thin films;
ZnO薄膜的结构与光学性能研究
2.
Photocatalystic properties of polycrystalline nano-ZnO thin films prepared by sol-gel;
多晶纳米ZnO薄膜的溶胶-凝胶法制备及光催化性能研究
3.
Structure and optical properties of ZnO thin films grown by laser molecular beam epitaxy;
LMBE法生长ZnO薄膜的结构和光学性能
3)  ZnO films
ZnO薄膜
1.
Study on transmission spectrum of ZnO films;
ZnO薄膜的透射光谱研究
2.
Structure and optical properties of ZnO films;
ZnO薄膜的结构特征及光学性能评价
3.
Study on characteristics of ZnO films deposition under various oxygen partial pressure using atomic force microscopy and Raman spectroscopy;
原子力显微镜结合拉曼光谱仪对不同氧分压制备ZnO薄膜性能研究
4)  ZnO Film
ZnO薄膜
1.
AFM and transmittance analysis of nonwovens deposited with ZnO film;
非织造布表面沉积ZnO薄膜的AFM和透光性分析
2.
Effect of sapphire substrate pre-treatment on the growth of ZnO films;
蓝宝石基片的处理方法对ZnO薄膜生长行为的影响
3.
RBS/Channeling study on elastic strain in ZnO film grown by MOVCD;
用卢瑟福背散射/沟道技术研究MOVCD方法生长的ZnO薄膜的弹性应变
5)  ZnO thin film
ZnO 薄膜
1.
According to the preparing method and technical condition of zinc oxide functional thin films,the effects of different dopants on structure,electric characteristics,optical characteristics,gas-sensitive properties and application field of ZnO thin film are summarized in this paper.
结合当前掺杂 ZnO 功能薄膜的制备方法、工艺条件,综述了不同掺杂元素对 ZnO 薄膜的结构、电学、光学性能、气敏特性以及应用领域等方面的影响,并展望了 ZnO 功能薄膜的发展趋势。
2.
In this thesis, we investigate the structural, optical and electronic properties of ZnO thin films and ZnO nanotubes pre.
自从日本和香港的科学家在1996 年首次实现了室温光泵浦条件下ZnO 薄膜的紫外受激发射以来,ZnO 材料研究成为国际光电子领域前沿课题中的研究热点。
3.
This research has prepared ZnO thin films with ultrasonic spry pyrolysis method.
采用超声雾化热解法制备 ZnO 薄膜,对比分析了不同 In 含量的 N-In 共掺杂 ZnO 薄膜的显微结构, 电学和光学性质。
6)  ZnO films
ZnO 薄膜
1.
XRD,SEM analysis and four probe method were employed to characterize the Mn-doped ZnO films.
采用射频磁控溅射法在 Si(100)衬底上沉积过渡族金属 Mn 掺杂的 ZnO 薄膜。
2.
In this paper,Zinc thin films were deposited onto glass substrates using magnetron sputtering in argon atmospheres,and then the surface of as-deposited films were followed by thermal oxidation processing in with the air pressure 5 Pa at 350℃ for 1h to form thin ZnO films.
采用磁控溅射法制备出表面具有纳米结构的金属 Zn 前驱体薄膜,并利用在低气压5Pa,温度350℃热氧化方法对其采取了处理,获得了接触角为151°, 可见光透过率达80%以上的超疏水 ZnO 薄膜。
补充资料:iron zinc oxide (fe2zno4)
CAS:12063-19-3
分子式:Fe2ZnO4
中文名称:氧化铁锌
英文名称:Iron zinc oxide;iron zinc oxide (fe2zno4);diiron zinc tetraoxide
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
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