1) HPPMS
高功率脉冲磁控溅射
1.
As a new technology providing high ionization rate of sputtering materials to deposit dense films with high performance,the high-power pulse magnetron sputtering(HPPMS) technology was\' comrehensively investigated in developed countries though it has seldom been reported in China.
高功率脉冲磁控溅射技术(HPPMS)作为一种溅射粒子离化率高、可以沉积致密、高性能薄膜的新技术已经在国外广泛研究,但在国内尚未见研究报道。
2) Pulse magnetron sputtering
脉冲磁控溅射
1.
The titania film deposited on cenosphere particles by pulse magnetron sputtering deposition was studied.
采用脉冲磁控溅射方法,开展了在空心微珠表面镀二氧化钛薄膜的研究。
3) magnetron sputtering power
磁控溅射功率
4) direct current pulse magnetron sputtering(DC-PMS)
直流脉冲磁控溅射(DC-PMS)
5) mid-frequency pulsed magnetron sputtering
中频脉冲磁控溅射
1.
Using a 2% Al-doped Zn target,ZnO∶Al(ZAO)thin films were deposited on a glass substrate by mid-frequency pulsed magnetron sputtering.
利用中频脉冲磁控溅射方法,以掺杂质量2%Al的Zn(纯度99。
2.
Using a Zn target with 2wt% Al, ZnO:Al(ZAO)thin films which were used on silicon thin film solar cells were deposited on glass substrate by mid-frequency pulsed magnetron sputtering.
本文利用中频脉冲磁控溅射技术,以掺杂Al 2wt%的Zn:Al合金靶为靶材,研究了用于硅薄膜太阳电池的ZnO:Al(ZAO)透明导电薄膜,主要完成了以下几方面的工作: 1、本实验使用的是美国AE公司的中频脉冲电源,采用中频脉冲磁控溅射的方法,首先在玻璃衬底上制备平面透明导电薄膜。
3.
Using a Zn target with 2wt% Al, ZnO:A(lZAO)thin films which were used on silicon thin film solar cells were deposited on glass substrate by mid-frequency pulsed magnetron sputtering.
本文利用中频脉冲磁控溅射方法,以掺杂Al 2wt%的Zn:Al合金靶为靶材,制备了用于硅薄膜太阳电池的绒面ZAO透明导电薄膜。
6) direct current pulse magnetron sputtering
直流脉冲磁控溅射
1.
Mo films were prepared on the Soda-lime glass(SLG) substrates by direct current pulse magnetron sputtering(DC-PMS).
利用直流脉冲磁控溅射方法在玻璃衬底上制备太阳电池背接触Mo薄膜。
补充资料：高功
1.政绩优异。 2.道教法师的专名。在举行宗教仪式时高座居中，在道士中被认为道功最高，故称。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条