1) In-Sn
铟-锡
2) indium tin oxide
氧化铟锡
1.
Several preparation methods of nano indium tin oxide powders in recent years are introduced.
介绍了近年来纳米氧化铟锡(ITO)粉末几种常用的制备方法,着重讨论了共沉淀法,溶胶-凝胶法,水热法等工艺,并比较了几种制备方法的优缺点。
2.
5TiO3 thin films used as insulating layer in thin film electroluminescent devices were prepared on indium tin oxide-coated Corning 1737 glass by radio frequency magnetron sputtering, and the effect of volume ratio of O2 to Ar+O2 V(O2)/V(Ar+O2) on deposition rate, crystallinity as well as dielectric properties of the Ba0.
采用射频磁控溅射法在镀氧化铟锡的Corning1737玻璃基片上制备了用于无机电致发光显示器绝缘层的Ba0。
3.
Indium tin oxide (ITO) thin films have been prepared by a sol-gel process using inorganic metal salts as raw materials.
以无机盐为出发原料,采用溶胶 凝胶法制备了氧化铟锡(ITO)透明导电薄膜。
3) separation indium and tin
铟锡分离
4) ITO
[英]['i:,təʊ] [美]['i,to]
氧化铟锡
1.
Study on the wettability between ITO target and indium;
氧化铟锡靶与铟的润湿性研究
2.
Preparation of ITO nanoparticles and their composite films with infrared property
纳米氧化铟锡粉体的制备及其复合膜的红外性能研究
3.
ITO (In2O3: SnO2 or Tin oxide doped indium oxide) films with nicer conductance, high visible light transmittance and lager reflectance in infrared region have been increasingly used in a variety of applications, such as organic light emitting diodes (OLED), liquid crystals display (LCD), electroma.
ITO (Indium Tin Oxide,氧化铟锡)薄膜以其良好的电导率性能、在可见光范围内的高透射性能以及在红外区内的高反射性能,成为制作透明电极材料的新宠,被广泛地应用于制造液晶平板显示器(LCD)、等离子体显示器、电致发光显示器、太阳能电池、节能视窗、汽车防雾玻璃等,应用前景广阔。
5) Sn-In alloy
锡-铟合金
1.
Sn,In,and Sn-In alloy coatings were deposited on the surface of current collector copper electrode via electrochemical route.
在电池集流体铜表面电沉积锡,锡溶解后易使其析氢量增加,电沉积铟在碱性溶液中抑氢效果好,但成本高,目前对锡-铟合金共沉积的效果研究甚少。
6) simultaneous determination of indium and tin
铟和锡
补充资料：氧化锡铟
分子式：
CAS号：
性质：由三氧化二铟和二氧化锡组成的化合物半导体。立方晶结构。晶格常数1.0118nm。禁带宽度约为2.65eV。一般为n型材料，折射率1.95。用化学喷涂法、电子束蒸发法和化学气相沉积法制备。太阳能电池的减反射膜和窗口材料。
CAS号：
性质：由三氧化二铟和二氧化锡组成的化合物半导体。立方晶结构。晶格常数1.0118nm。禁带宽度约为2.65eV。一般为n型材料，折射率1.95。用化学喷涂法、电子束蒸发法和化学气相沉积法制备。太阳能电池的减反射膜和窗口材料。
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参考词条