1) electronic exposure camera
电子曝光照相机
3) multi-enposure photography
多曝光照相
4) electron beam exposure machine
电子束曝光机
1.
The paper presents the constitution features and experimental results of deflection system of the DY-5 electron beam exposure machine.
本文将重点介绍ＤＹ－５型电子束曝光机的偏转系统的构成、特点及结果。
2.
In electron beam exposure machines the coincidence of three correspon-ding coordinate systems of stage movement, electro-magnetic deflection andmark is one of the important factors which affect pattern stitching accu-racy.
在电子束曝光机中，工件传动台、电磁偏转场及标记三者相对应的座标轴是否重合，是影响图形拼接精度的重要因素之一。
3.
The wave trap is applied to measure the beam current in the electron beam exposure machine.
提出一种应用于电子束曝光机束流测量中的自动跟踪工频陷波器 ,给出电路结构 ,基于对其工作原理的分析 ,介绍了提高陷波器跟踪精度的设计要点及调试方
5) E-beam lithography system
电子束曝光机
1.
The proximity effect in the E-beam lithography system was verified by experiments.
利用电子束曝光机完成有关邻近效应的实验 。
2.
A kind of utility program for JBX-6AII, a kind of variable-shaped e-beam lithography system was developed out.
本论文介绍了文中所实现的微机版可变矩形电子束曝光机图形数据转换软件的相关系统设计、流程设计、算法设计等。
6) E-beam lithography machine
电子束曝光机
1.
The configuration,technology solutions and all performances of laser stage system for E-beam lithography machine were described.
介绍了nm级电子束曝光机激光定位精密工件台系统的结构组成、各部分技术措施及总体性能指标。
2.
Measurement system of precision stage shows its important role for the correction technology of E-Beam lithography machine.
由于电子束曝光机采用的修正技术,工件台的测量系统显得十分重要。
补充资料：自动曝光
自动曝光
ae：自动曝光
automatic exposure，主要分为三类，全自动程式曝光，光圈先决曝光以及快门先决曝光
说明：补充资料仅用于学习参考，请勿用于其它任何用途。