1.
The elementary exposure pattern of a variable rectangular electron beamexposure machine is a rectangle.
可变矩形电子束曝光机的基本曝光图形是矩形。
2.
Research on Focusing-deflection System for Nanometer-scale Electron Beam Lithography Machine;
纳米级电子束曝光机聚焦偏转系统的研究
3.
E-beam Lithography Stage Controller Design Based on FPGA
基于FPGA的电子束曝光机工件台控制器设计
4.
Rearch of Mark-Detection and Registration in Scanning-Electron-Beam Lithographic System;
扫描电子束曝光机背散射电子检测与对准技术的研究
5.
APPLICATION OF PHASE-LOVKED METHOD IN CONSTANT SPEED CONTROL OF STAGE OF EB EXPOSURE MACHINE
锁相技术在电子束曝光机工件台稳速控制中的应用
6.
The Research and Development of the Utility Program about Graphic Data Conversion for E-beam Lighography System;
可变矩形电子束曝光机图形数据转换软件的实用化研制
7.
The composition,principle and working procedure of the application software of EBES-40A electron beam Lithography system are introduced.
本文简要地介绍了一种圆形电子束曝光机应用软件的结构、工作原理及工作过程；
8.
variable shaped electron beam exposure system
可变电子束曝光装置
9.
electron beam projection exposure apparatus
电子束投影曝光装置
10.
The E-beam Lithograpy Control System Based on VC++6.0
基于VC++6.0的电子束曝光控制系统
11.
The Research of Mark Signal Detection and Alignment Technology Used in High-energy Projection Electron Beam Lithography System with Demagnification Imaging (PELDI);
高能电子束缩小投影曝光机标记信号检测及对准技术的研究
12.
Study of Pattern Generator for Nanometer E-beam Lithography System;
纳米级电子束曝光系统用图形发生器技术研究
13.
Measurement System of Precision Stage for E-Beam Aligner
电子束曝光系统中精密工件台的测量系统
14.
Research on Microchannel Fabrication of PCR Chip by Electron Beam Lithography Based on Overlapped Scanning
电子束重复曝光加工PCR微通道的工艺研究
15.
selenium cell(eg the exposure meter of a camera)
硒光电池（如照相机曝光计中的）.
16.
adding and copying machine
[花筒]连续曝光机
17.
raster scan electron beam lithography
光栅扫描电子束光刻
18.
Within the field of view of a television or movie camera.
曝光处于电视机或电影摄像机视场之内