1) curved polisher
曲面抛光器
2) polished aluminum surface reflector
抛光铝面反射器
3) polished chrominum surface reflector
抛光铬面反射器
4) wax-faced pitch polisher
蜡面沥青抛光器
5) Metope-Polishing Robot
墙面抛光机器人
6) double-sided polishing
双面抛光
1.
Based on the analysis of the process of double-sided polishing,we establish a mathematical model when the double-sided polishing machine working in a calm movement state,simulate the process of double-sided polishing by programming language as changing the parameters.
分析了双面抛光机的加工过程,建立了抛光晶片在双面抛光机平稳运动状态下运动的数学模型,采用计算机对双面抛光加工进行运动仿真,并通过改变不同的参数值,得出抛光过程中不同参数对抛光效果的影响。
2.
The wafer motion and the load in double-sided polishing process are main factors which affect the wafer surface quality.
晶片在双面抛光加工过程中具有多向运动、受力复杂、表面材料微细去除的特征,晶片的运动和受力是影响双面抛光加工质量的主要因素。
3.
According to the characteristics of core,clad and solid rim glass material of microchannel plate(MCP),the mechanism of double-sided polishing of MCP was analyzed.
基于微通道板皮料、芯料、实体边玻璃材料的特点,分析了微通道板的双面抛光机理,研究了抛光工艺参数(抛光粉、抛光压力、抛光液pH值等)对MCP平面粗糙度、表面质量的影响,提出了微通道板的抛光工艺及参数:抛光粉应选择莫氏硬度为6、粒度为1。
补充资料：蜡面
1.见"蜡面茶"。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条