2) diode sputter
两电极离子溅射装置
3) ion sputtering
离子溅射
1.
Application of ion sputtering in plasma nitriding of austenitic stainless steel
离子溅射在奥氏体不锈钢离子渗氮中的应用
2.
Effect of ion sputtering platinum on photocatalytic degradation of ethylene in the environment of cold storage
离子溅射Pt对光催化降解冷藏环境中乙烯的影响
3.
Silicate substrates were coated by ion sputtering with nickel,and then used to catalyze the decomposition of low hydrocarbons to prepare the relatively well distributed carbon nanotubes films(CNFs).
1 实验部份1 1 镀膜与后处理采用离子溅射法在硅酸盐基板上镀镍,镀镍电流7 5mA,镀镍时间分别为2min、15min、30min、45min或60min;对镀镍基板再进行蚀刻(蚀刻电流7 5mA,蚀刻时间2min)或用氨水浸泡处理(含NH325%,超声振荡30min),然后烘干备用。
4) ion-beam sputtering
离子束溅射
1.
Si/Ge multilayer films were prepared by ion-beam sputtering.
采用离子束溅射制备Si/Ge多层膜,通过X射线小角衍射计算其周期厚度及各子层的厚度,用Raman光谱对Si/Ge多层膜的微观结构及Si子层的结构进行表征。
2.
Si/Ge multilayer films have been prepared by ion-beam sputtering on glass substrates with different periods.
采用离子束溅射技术,在玻璃衬底上制备了不同周期数的Si/Ge多层膜样品。
3.
A series of AgNiMnGa nano-granular films with different combinations of component materials were fabricated by using ion-beam sputtering technique.
利用离子束溅射技术制备了AgNiMnGa颗粒膜的系列样品。
5) Ar ion sputtering effect
Ar离子溅射
6) ion-beam sputter
离子束溅射
1.
Polymer fluorocarbon films on polyester were prepared under various discharge conditions by ion-beam sputtering and characterized by using XPS.
在不同放电条件下利用离子束溅射法制备了聚酯膜基底上的氟碳高分子膜 。
2.
The LSCO films which on yttria-stabilized zirconia(YSZ) andaluminates lanthanum (LaAlO_3)were obtained by ion-beam sputtering method.
本论文采用离子束溅射工艺在氧化钇稳定的氧化锆(YSZ)和铝酸镧(LaAlO_3)衬底上制备La_(0。
补充资料：溅射离子泵（scatteringionpump）
溅射离子泵（scatteringionpump）
溅射离子泵的结构如图。阳极为一薄壁不锈钢筒，阴极为两块薄钛板，分置阳极两方。阳极、阴极一同装于不锈钢外壳中，整个壳体装于一磁场中，磁力线方向平行于阳极筒轴向，磁通密度约1000～2000Gs，工作时极间电压为3～7kV产生潘宁放电，这是一种在很低压强下仍能自持的放电，所以能运用于高真空和超高真空。放电产生的离子轰击阴极时引起金属钛的溅射，溅射的钛沉积于阳极筒内壁及阴极上离子轰击较少的部位。不断地形成新鲜的活性钛膜，吸附气体分子。同时又连续地掩埋吸附于阳极筒内壁及阴极边角部位的气体分子（对惰性气体也有效），形成泵的抽气作用。真空度可达10-11Torr量级。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条