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1)  micrometer(μm),micron(μ)
微米<光>
2)  microfiber
微米光纤
1.
The fabrication and transportation characteristic of optical microfiber knot resonators;
微米光纤环形谐振腔的构造与传输特性的研究
3)  sub-micron gratings
亚微米光栅
1.
Research on transmission diffraction characteristics of sub-micron gratings for light guide plate;
用于光导板的亚微米光栅透射衍射特性分析
2.
By using rigorous coupled-wave theory,the relationship between the first order transmission efficiency and the depths of grooves and the incidence angles is analyzed when lights transmit from sub-micron gratings′ optically denser medium to optically thinner medium.
提出了利用亚微米光栅制作光导板的方法,用严格耦合波理论计算分析了亚微米光栅从光密介质到光疏介质的1级透射衍射效率与光栅槽深、入射角度的关系,讨论了在满足基底全反射条件的入射角时对应于R、G、B三原色光的亚微米光栅(0。
4)  sub-micron grating
亚微米光栅
1.
Design and fabrication of sub-micron grating with given filter character for anti-counterfeiting;
具有特定滤波特性的防伪用亚微米光栅的设计和制作
2.
The light-guiding properties of sub-micron gratings have been studied based on the linear part of the relationship curves.
8nm的亚微米光栅组成,用红、绿、蓝三色LED作为光源,通过光栅空频控制出射光方向、槽深调节衍射效率,达到导光棒出射光源的均匀性。
3.
Firstly, the diffraction properties of sub-micron gratings is analyzed using rigorous coupled-wave theory, including the relationship of the direction of diffraction light in each grade and grating period, and the r.
文中首先利用严格耦合波理论(RCWA)分析亚微米光栅的衍射特性,即各级次衍射光方向与光栅周期及入射光角度的关系,亚微米光栅的衍射效率与槽深的关系。
5)  submicron photolithography
亚微米光刻
1.
Optical proximity correction for improving pattern quality in submicron photolithography;
光学邻近校正改善亚微米光刻图形质量
6)  submicron lithography
亚微米光刻
1.
In order to study the feasibility of submicron lithography using second harmonic light of a copper vapor laser(CVL), a 1∶1 catadioptric projection lens, and an illumination system which consists of a rotating diffuser and a ligth pipe, are designed and constructed.
3nm的铜蒸气激光倍频光在亚微米光刻中的可行性,设计了带宽为1nm的11折反射式投影光刻物镜和一个带散射板的光管式均匀照明系统,获得了0。
2.
Experimental results of deep submicron lithography with a excimer laser are reported in this paper.
报道用远紫外准分子激光进行亚微米光刻的实验结果。
补充资料:表光合强度(见光合强度)


表光合强度(见光合强度)
forecast of sowing or transplanting time

b iaoguanghe qiangdu表光合强度见光合强度
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
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