1) Gate Oxide Rupture
栅氧缺陷
2) gate oxide defect
栅氧化层缺陷
3) Oxygen-deficient defects
缺氧缺陷
4) oxygen deficiency
氧缺陷
1.
The oxygen deficiency in the CexZr1-xO2-δ solid solution was determined by indirect redox-titrimetry after dissolving the solid sample in 3 mol/L sulphuric acid.
用3 mol/L硫酸溶液溶解样品,(NH4)2Fe(SO4)2作为还原剂,K2Cr2O7作为氧化剂,利用间接氧化还原法测定CexZr1-xO2-δ固溶体的氧缺陷值δ,方法的相对标准偏差为1。
2.
As the oxygen pressure decreases, the oxygen deficiency increases.
在3 0×1 0 - 5帕氧气压下生长的薄膜中氧缺陷可达0 48,但是样品的四方相结构可以很好的维持。
3.
These can be attributed to the disordered characteristic due to the oxygen deficiency in the film and the interface between the Fe an.
5)MnO_(3-δ)层的氧缺陷有关。
5) Oxidation defect
氧化缺陷
6) Kisser
[英]['kisə] [美]['kɪsɚ]
压氧缺陷
补充资料：点缺陷(见晶体缺陷)
点缺陷(见晶体缺陷)
point defect
点缺陷point defeet见晶体缺陷。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条