2) cuprous nitride
氮化亚铜
3) Cu3N thin film
氮化铜薄膜
1.
Anode materials of Cu3N thin film were prepared on stainless steel by radio frequency magnetron sputtering.
采用射频磁控溅射法在不同温度的不锈钢基片上制备了氮化铜薄膜电极。
4) copper nitride film
氮化铜薄膜
1.
Copper nitride film and Fe-doped copper nitride film are deposited on glass substrates by reactive magnetron sputtering at N_2-gas partial pressure of 0.
5Pa、基底温度100℃条件下,在玻璃基底上分别制备了氮化铜薄膜和铁掺杂氮化铜薄膜。
5) copper nitride thin films
氮化铜薄膜
1.
Effect of nitrogen pressure on structure and optical band gap of copper nitride thin films;
氮分压对氮化铜薄膜结构及光学带隙的影响
6) Cu_3N films
氮化铜薄膜
1.
In recent years, there has been much interest in studying the properties of Cu_3N films.
目前使用最多、工艺相对成熟的制备氮化铜薄膜的方法是具有高效性和简便性的射频磁控溅射法。
补充资料：叠氮化铜
化学式Cu(N3)2。紫黑色粉末,易爆炸;不溶于水;与氨形成Cu(NH3)2(N3)2。由叠氮化钠与铜(Ⅱ)盐反应而得。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条