1) hard magnetic film
硬磁薄膜
1.
Therein, the CoP series hard magnetic films attract great attentions due to their excellent hard magnetic properties.
钴基磁性薄膜在现代高技术磁性材料中占有重要的地位，其中，CoP系硬磁薄膜以其优异的硬磁性能引起了人们极大的关注。
2) hard coating
硬质薄膜
1.
A new method-stripping layer-substrate curvature was put forward to determine the residual stresses of hard coatings.
提出了一种测量硬质薄膜残余应力的新方法——剥层曲率半径法,并设计了一套光杠杆系统,可以精确测量镀膜样品因薄膜存在残余应力而造成试片弯曲的曲率半径,从而计算出薄膜的残余应力。
3) hardness of film
薄膜硬度
1.
When the working gases flux ratio of C2H2/(N2+Ar) is less than 1/9,the hardness of films is relatively high,while with the increase of C2H2 flux,the har.
通过改变工作气氛、基体负偏压等工艺参数,对制备薄膜的硬度进行检测分析,结果表明:在Ti(C,N)薄膜的制备中,工作气氛和基体负偏压是影响薄膜硬度的主要因素。
4) superhard films
超硬薄膜
1.
The current achievements in superhard films were reviewed including diamond,diamond-like,c-BN,B-C-N,nano-multilayer and nano-composite films in the past several years.
本文介绍了碳系列薄膜、纳米多层及纳米复合超硬薄膜近年来所取得的研究成果 ,重点是氮化物纳米多层与复合超硬薄膜的研究状况 ,并对纳米多层膜在应用中存在的问题提出了解决的思路 ,指出了超硬薄膜的发展趋
5) magnetic thin film
磁性薄膜
1.
Integrated processes of YIG magnetic thin film in low temperature;
YIG磁性薄膜低温集成工艺
2.
Research progress of measured methods for microwave electromagnetic parameter of magnetic thin films;
磁性薄膜微波电磁参数测试方法研究进展
3.
Formation mechanism and physical properties of a magnetic thin film system deposited on liquid substrates;
沉积在液相基底表面磁性薄膜的形成机理和特性研究
6) soft magnetic thin film
软磁薄膜
1.
The study of crystallization kinetics of CoNbZr amorphous soft magnetic thin films;
CoNbZr非晶软磁薄膜晶化动力学研究
2.
In this paper, a hysteresis loop measurement system for soft magnetic thin film based on Faraday s law of electromagnetic induction is put forward, and the principle, hardware and software realization of the system are also described.
开发了基于法拉第电磁感应定律的软磁薄膜磁滞回线测试系统,论述了这种系统的原理及硬件和软件的实现。
3.
NiFe soft magnetic thin films fabricated for high frequency magnetic impedance effect are discussed.
讨论了用于高频磁阻抗效应传感技术的ＮｅＦｅ软磁薄膜制备和薄膜单轴各向异性产生方法及机理。
补充资料：稀土石榴石单晶薄膜磁光材料
分子式：
CAS号：
性质：用外延生长法在常用衬底Gd3Ga5O12单晶(111)晶面上生成稀土石榴石单晶薄膜材料。恒温5～30min，可得薄膜2～30μm。利用生长工艺参数的变化可制取不同组成和性能的磁光薄膜材料。
CAS号：
性质：用外延生长法在常用衬底Gd3Ga5O12单晶(111)晶面上生成稀土石榴石单晶薄膜材料。恒温5～30min，可得薄膜2～30μm。利用生长工艺参数的变化可制取不同组成和性能的磁光薄膜材料。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条