2) thin film deposition
薄膜沉积
1.
Fresnel lens fabricated by thin film deposition;
薄膜沉积法制作菲涅耳透镜
2.
A novel technique-anodic vacuum arc coating for thin film deposition is reviewed in this paper.
本文介绍了一种新的薄膜沉积方法──阳极真空电弧镀膜法。
3.
The 16-step Fresnel lens had been fabricated by thin film deposition and ion beam etching and it has been used in refractive-diffractive CCD camera.
使用薄膜沉积法和离子束刻蚀法制作１６阶菲涅耳透镜，应用于折衍混合ＣＣＤ相机。
3) film deposition
薄膜沉积
4) sedimental CeO 2 film
沉积CeO2薄膜
5) As-deposited film
沉积态薄膜
6) deposition rate
沉积速率
1.
Effects of technological conditions on deposition rate and structure of functional Co-B films prepared by electroless plating;
化学镀工艺对Co-B功能膜沉积速率与结构的影响
2.
Effects of deposition rate on surface topography of Ni-Cr thin film deposited by EB-PVD;
沉积速率对EB-PVD Ni-Cr薄膜表面形貌的影响
3.
Influences of process parameters on deposition rate of CVI-TaC;
工艺参数对CVI-TaC沉积速率的影响
补充资料：电沉积速率
分子式：
CAS号：
性质：用单位时间内沉积电镀层的平均厚度来表示，单位μm/h。
CAS号：
性质：用单位时间内沉积电镀层的平均厚度来表示，单位μm/h。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条