1) Negative ions bombardment
负离子反溅射
2) Cs sputtering negative ion source
铯负离子溅射源
1.
Carbon cluster ion beams were extractrd from a Cs sputtering negative ion source with a graphite sputtering cathode.
利用铯负离子溅射源（ＳＮＩＣＳ－Ⅱ）和石墨阴极产生并引出了碳团簇负离子流，观察到了一些电子亲和势很小的团簇。
3) Reactive ion-beam sputtering
反应离子束溅射
4) Ion beam reactive sputtering
离子束反应溅射
5) ion sputtering
离子溅射
1.
Application of ion sputtering in plasma nitriding of austenitic stainless steel
离子溅射在奥氏体不锈钢离子渗氮中的应用
2.
Effect of ion sputtering platinum on photocatalytic degradation of ethylene in the environment of cold storage
离子溅射Pt对光催化降解冷藏环境中乙烯的影响
3.
Silicate substrates were coated by ion sputtering with nickel,and then used to catalyze the decomposition of low hydrocarbons to prepare the relatively well distributed carbon nanotubes films(CNFs).
1 实验部份1 1 镀膜与后处理采用离子溅射法在硅酸盐基板上镀镍,镀镍电流7 5mA,镀镍时间分别为2min、15min、30min、45min或60min;对镀镍基板再进行蚀刻(蚀刻电流7 5mA,蚀刻时间2min)或用氨水浸泡处理(含NH325%,超声振荡30min),然后烘干备用。
6) SNICS-source of negative ions by cesium sputtering
铯溅射型负离子源
补充资料：1,3-负离子环加成
分子式：
CAS号：
性质：由烯丙基负离子参与的2+3环加成反应。
CAS号：
性质：由烯丙基负离子参与的2+3环加成反应。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条