1) Ar ion sputtering effect
Ar离子溅射
2) ion sputtering
离子溅射
1.
Application of ion sputtering in plasma nitriding of austenitic stainless steel
离子溅射在奥氏体不锈钢离子渗氮中的应用
2.
Effect of ion sputtering platinum on photocatalytic degradation of ethylene in the environment of cold storage
离子溅射Pt对光催化降解冷藏环境中乙烯的影响
3.
Silicate substrates were coated by ion sputtering with nickel,and then used to catalyze the decomposition of low hydrocarbons to prepare the relatively well distributed carbon nanotubes films(CNFs).
1 实验部份1 1 镀膜与后处理采用离子溅射法在硅酸盐基板上镀镍,镀镍电流7 5mA,镀镍时间分别为2min、15min、30min、45min或60min;对镀镍基板再进行蚀刻(蚀刻电流7 5mA,蚀刻时间2min)或用氨水浸泡处理(含NH325%,超声振荡30min),然后烘干备用。
3) ion-beam sputtering
离子束溅射
1.
Si/Ge multilayer films were prepared by ion-beam sputtering.
采用离子束溅射制备Si/Ge多层膜,通过X射线小角衍射计算其周期厚度及各子层的厚度,用Raman光谱对Si/Ge多层膜的微观结构及Si子层的结构进行表征。
2.
Si/Ge multilayer films have been prepared by ion-beam sputtering on glass substrates with different periods.
采用离子束溅射技术,在玻璃衬底上制备了不同周期数的Si/Ge多层膜样品。
3.
A series of AgNiMnGa nano-granular films with different combinations of component materials were fabricated by using ion-beam sputtering technique.
利用离子束溅射技术制备了AgNiMnGa颗粒膜的系列样品。
4) ion-beam sputter
离子束溅射
1.
Polymer fluorocarbon films on polyester were prepared under various discharge conditions by ion-beam sputtering and characterized by using XPS.
在不同放电条件下利用离子束溅射法制备了聚酯膜基底上的氟碳高分子膜 。
2.
The LSCO films which on yttria-stabilized zirconia(YSZ) andaluminates lanthanum (LaAlO_3)were obtained by ion-beam sputtering method.
本论文采用离子束溅射工艺在氧化钇稳定的氧化锆(YSZ)和铝酸镧(LaAlO_3)衬底上制备La_(0。
5) sputter ion pump
溅射离子泵
1.
Abstract: The structures and operating methods of turbo molecular pump with non-oil ultra high vacuum system and sputter ion pump with non-oil ultra high vacuum system are introduced, and their relevant characters are discussed.
对涡轮分子泵无油超高真空系统及溅射离子泵无油超高真空系统的结构及操作方法作了介绍，并对它们相关的特性进行了讨论。
6) Ion beam sputtering
离子束溅射
1.
Influence of Ar~+ energy on the crystalline property of Ge films fabricated by ion beam sputtering;
溅射Ar~+能量对离子束溅射制备Ge薄膜结晶性的影响
2.
Samples temperature in ion beam sputtering and its control;
离子束溅射工艺中的基片温度及其控制方法
3.
Observation on surface morphology of Ge nano-films grown by ion beam sputtering
离子束溅射生长Ge纳米薄膜的表面形貌观察
补充资料：ar,ar-diethyl-ar-methylbenzenediamine
CAS：68479-98-1
分子式：C11H18N2
中文名称：二乙基甲苯二胺；芳基,芳基二乙基-芳基-甲基苯二胺
英文名称：ar,ar-diethyl-ar-methyl-Benzenediamine；Diethyltoluenediamine；ar,ar-diethyl-ar-methylbenzenediamine；ar,ar-diethyl-ar-methyl-benzenediamin；diethyl tolamine
分子式：C11H18N2
中文名称：二乙基甲苯二胺；芳基,芳基二乙基-芳基-甲基苯二胺
英文名称：ar,ar-diethyl-ar-methyl-Benzenediamine；Diethyltoluenediamine；ar,ar-diethyl-ar-methylbenzenediamine；ar,ar-diethyl-ar-methyl-benzenediamin；diethyl tolamine
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条