1) single-beam direct overwrite
单光束直接重写
2) light intensity modulated direct overwrite
光调制直接重写
1.
A testing system for the light intensity modulated direct overwrite magneto optical multilayered films is designed successfully.
为了测试光调制直接重写磁光多层膜的磁光性能 ,试制了磁光多层膜光调制直接重写特性测试系统。
4) electron beam direct-write exposure
电子束直写曝光
5) electron beam direct-writing lithography
电子束直写光刻
1.
Patterned media with nickel nanopillar arrays as the magnetic recording units was prepared with electron beam direct-writing lithography and electrodeposition.
以电子束直写光刻图形为模版,采用直流电沉积和数值模拟的方法,研究了镍纳米柱阵列图案化磁记录介质的制备工艺和模版电沉积过程中的沉积不均匀问题。
6) laser direct writing
激光直接写入
1.
This provides a convenient way for investigating laser direct writing process.
同时，通过对显影速率作阈值近似后，导出了光刻胶曝光显影后面形与表面所需曝光量分布之间的关系，为激光直接写入提供了理论指导。
2.
In the single point laser direct writing (LDW) process, there are some difference between the exposure dose distribution and the light intensity distribution, and the difference will bring the line profile errors.
基于直角坐标激光直接写入系统和极坐标激光直接写入系统,分别给出了曝光量分布的计算公式,讨论了曝光量分布和光强分布之间的差别。
补充资料：单光束散斑干涉法
见散斑干涉法。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条