1) Gas flow ratio
气流配比
2) reactant mixture gas
气体配比
1.
The relationship between the reactant mixture gas used to produce SiOxNy film by PECVD method and the composition, refractive index and electric inductivity of the film is investigated.
研究了等离子体增强化学气相淀积（ＰＥＣＶＤ）法制备ＳｉＯｘＮｙ膜工艺中混合气体配比与薄膜中氮、氧含量间的变化关系以及对膜层折射率、介电常数的影响。
4) gas ratio
配气比例
1.
4% when the gas ratio of CO2:N2:He equals 3:9:28 and a total gas pressure is 40 kPa under the condition of same injection exciting electric energy.
针对大功率脉冲TEA CO2激光器的放电腔在不同工作气压和不同配气比例条件下对激光器输出能量和电光转换效率均有较大影响,研究了充气压力从30kPa到60kPa,配气比例由CO2:N2=1:1到CO2:N2=1:4变化条件下,放电腔工作气压和配气比例对激光器输出能量和转换效率的影响。
5) flow-mixing
流量配比
1.
The characteristics of oil and water flow-mixing control system for emulsion explosive product line and disadvantages of PID controller were introduced.
介绍了乳化炸药生产线油水相流量配比控制系统的工艺特点和PID控制器的缺陷,引入了模糊控制器,并阐述了其结构原理和具体设计过程,同时给出了由PLC实现的模糊控制程序设计。
2.
This paper illustrates the characteristics of flow-mixing control system of emulsion explosive product line and disadvan-tag es of PID controller.
分析乳化炸药生产线油水相流量配比控制的工艺特点和现有PID控制器的缺陷,引入了模糊控制器并阐述了其结构原理和具体设计过程,输出结果由Matlab6。
补充资料：调和设备——配比器
调和设备——配比器     | ||
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说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条