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1)  ion sputtering deposition
离子束溅射淀积
2)  dual-ion sputtering deposition
双离子束溅射淀积
3)  ion beam sputtering deposition
离子束溅射沉积
1.
Diamond-like carbon films(DLC films) were prepared by ion beam sputtering deposition and the effects of the bias on the properties of the films were studied.
采用离子束溅射沉积镀膜法制备了DLC薄膜,研究了偏压对薄膜性能的影响。
4)  ion beam aided sputtering deposition
离子束辅助溅射沉积
5)  Dual ion beam sputtering deposition
双离子束溅射沉积
1.
Cr-doped SiC films were fabricated on Si and KBr substrates by using dual ion beam sputtering deposition with Cr-metal pasted on a high-purity SiC sintered target.
利用高纯SiC烧结靶上粘贴金属Cr片的复合靶用双离子束溅射沉积方法,在Si和KBr单晶衬底上制备了掺杂SiC薄膜。
6)  ion beam co-sputtering technique
离子束溅射-沉积工艺
补充资料:双低能离子束薄膜淀积设备


双低能离子束薄膜淀积设备


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