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1)  Relief depth
浮雕深度
2)  deep relief
深浮雕
1.
To solve the two key techniques-relief deepness and profile control, which are arisen in fabricating the deep relief successive non-sphere micro-optical devices, the positive resist AZ9260 of small absorption coefficient is selected for the experimental research.
为解决研制深浮雕连续非球面微光学元件所面临的浮雕深度和面型控制这两大难点,选取吸收系数小的AZ9260正性光刻胶进行实验研究。
3)  Deep continuous relief
连续深浮雕
4)  high-relief carving
深浮雕(刻法)
5)  relief amplitude
浮雕幅度
1.
The principle and method of measuring the modulation amplitude of refraction index and relief amplitude of phase holographic medium with knife demodulating technique is presented in this paper,lts character is that measuring process is simple and measuring speed is fast.
提出利用刀口解调技术测量位相型记录介质折射率调制幅度和浮雕幅度的原理和方法,其特点是测量过程简单,速度快。
6)  relief height
浮雕高度
补充资料:淡黄釉高浮雕云龙纹烟壶

 

底部有“王炳荣作”四字款。王氏是著名雕瓷大师,其作品存世极少,足见该壶之珍贵。

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