2) correction model
校正模型
1.
The useful near-infrared spectrum information was picked up by using genetic algorithms,and the near-infrared quantitative correction model was established by partial least squares(PLS) method.
以两组棉制品为研究对象,利用遗传算法提取有效近红外光谱信息,采用偏最小二乘法(partial least squares,简称PLS)建立了棉制品中含棉量的近红外定量的校正模型,讨论了遗传算法提取有用信息的具体应用方法。
2.
This paper relates to a correction model based on the computation according to position and height of each building as well as imaging parameters of sensors,which has been applied to an area in Shanghai for rectifying the green cover rate and green belt areas in a remote sensing research.
在分析城市绿化遥感中常用遥感数据成像特点的基础上,推导出投影误差造成的遮蔽面积公式,建立遥感遮蔽校正模型。
3.
In view of characteristics of pressure sensor affected by temperature changes and voltage fluctuation,a correction model of pressure sensor is presented based on Support Vector Machine.
针对压力传感器输出特性受温度变化和电压波动影响的问题,提出了应用支持向量机对压力传感器输出特性进行非线性补偿的校正模型。
3) Calibration model
校正模型
1.
The spectrum data sample characteristic choice,the data pretreatment,and the SVM Calibration model parameter optimization and mixture gas spectral analysis structure based on level were summarized and prop.
提出了光谱数据样本特征选择、数据预处理、SVM校正模型参量优化及层次式混合气体光谱分析结构等关键技术。
2.
The influence of calibration constant K,spectrum region selection and spectrum prepro- cessing on the veracity of a calibration model when establishing a model for rapidly determining aroma composition in naphtha by near-infrared spectroscopy are analyzed.
在采用近红外光谱建立石脑油芳烃含量校正模型的过程中,分析讨论了校正系数K值、光谱区域选取及光谱预处理方法对校正模型准确性的影响。
3.
By using type ZX440 near infrared petroleum analyzer,the calibration model of total sulfur content of jet fuels was established.
采用ZX440型近红外多组分油料分析仪建立了喷气燃料总硫含量的校正模型,对校正模型的准确性进行了验证,实际分析结果表明,近红外光谱分析可以实现对喷气燃料总硫含量的快速、准确测定。
4) forward model
正演模型
1.
Application of a well-constrained forward model technique in solving difficulties of stratigraphic trap description——taking Jiyang Depression as an example;
应用井约束正演模型技术解决地层圈闭描述中的几个难题——以济阳坳陷为例
2.
AVO forward model study in gas-sandstone;
含气砂岩AVO正演模型研究
3.
AVO forward model study;
AVO正演模型研究及应用
5) forward modeling
正演模型
1.
Analysis on spectral decomposition response of reservoir based on forward modeling;
基于正演模型的储层谱分解响应特征分析
2.
Based on the response characteristics of the resistivity forward modeling of sand body,the applying feasibility of CSAMT method to the exploration of sand body is discussed.
本文从砂体电阻率正演模型响应特征分析出发,探讨了CSAMT法在砂体探测中的可行性。
3.
We studied the velocity reversal with forward modeling, revealing that the velocity reversal was caused by large reversed faults.
对这种速度逆转现象 ,应用正演模型技术进行分析研究 ,认为这主要是由于存在较大逆掩断层造成的。
6) correction model
修正模型
1.
The current major application fields of satellite positioning some of tropospheric refraction correction model are introduced.
系统地分析对流层延迟特性在GPS导航中造成的定位误差,并主要介绍目前卫星定位领域主要应用的一些对流层折射修正模型。
2.
A new correction model for the target deviation is deduced when the optical axis is not parallel to the collimating axis, and the coordinates of the camera projection center in measuring coordinate systems are calculated in conditions of the mismatching between the optical center and the theodolite rotation center by using the object focus optical system as the projective center of camera system.
分析了目前采用的脱靶量修正模型的适用条件,采用坐标变换法推导出经纬仪脱靶量修正公式,获得了与球面三角学相一致的推导结果,并在此基础上推导出成像系统无照准轴平行约束条件的通用脱靶量合成公式。
3.
A profit distribution correction model for EPC engineering supply chain based on Shapley value was proposed which makes the profit distribution more reasonable.
针对EPC交钥匙工程,详细分析了shapley值法分配供应链利益的不足,综合考虑了诸多影响因素,提出了一个新的基于shapley值法的EPC工程建筑供应链合作企业的利益分配修正模型,使建筑供应链的利益分配更加合理。
补充资料：正型光刻胶
分子式：
CAS号：
性质：由光分解剂和碱性可溶性树脂及溶剂组成，为重氮萘醌磺酸酯及线性酚醛制成。在受紫外光照射后光照区光分解剂发生分解，溶于有机或无机碱性水溶液，未曝光部分被保留下来，与母版形成相同的图形。该品为琥珀色液体。易溶于醚、酯、酮等有机溶剂，其特点是分辨率好，可以获得亚微米级线宽图形。由于感光速度快，可用于投影曝光和分步重复曝光。在相对湿度50％的环境中对氧化硅、多晶硅以及铝、铜、金、铂等均有很好的黏附性和抗蚀性。其显影和曝光操作宽容度大、易于剥离，且耐热性好、可以耐140℃的烘烤，图形不变形。本品适用于大规模集成电路和电子元器件及光学机械加工工艺的制作。
CAS号：
性质：由光分解剂和碱性可溶性树脂及溶剂组成，为重氮萘醌磺酸酯及线性酚醛制成。在受紫外光照射后光照区光分解剂发生分解，溶于有机或无机碱性水溶液，未曝光部分被保留下来，与母版形成相同的图形。该品为琥珀色液体。易溶于醚、酯、酮等有机溶剂，其特点是分辨率好，可以获得亚微米级线宽图形。由于感光速度快，可用于投影曝光和分步重复曝光。在相对湿度50％的环境中对氧化硅、多晶硅以及铝、铜、金、铂等均有很好的黏附性和抗蚀性。其显影和曝光操作宽容度大、易于剥离，且耐热性好、可以耐140℃的烘烤，图形不变形。本品适用于大规模集成电路和电子元器件及光学机械加工工艺的制作。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条