This paper aims at the problem of some different etch factor’s calculational method in the PCB industry , via a series of trial and the analysis of Microsection , some opinion of calculational method was brought forword .

The distribution of C, O, N, Cl elements in ternary polyurethane/epoxy/poly-B-propylene glycol diacrylate(PUR/EP/PPGDA) IPNs' surface was analyzed by X-ray photoelectron spectroscopy and the internality was analyzed with argon ion etching.

In order to make high quality junctions we have done some researches on reaction ion etching(RIE) method and ion etching method.

This paper applies the thermal spikes effect and ion etching effect to explain the formation of DLC films by analyzing the effects of energy particles.

The speed of etching the sample was determined by controling the size ofion beam and voltage of two pole of ion beam,By the technigue of ion etching,themicroshape of the mite leg and the mite boby of the Tetranychus truncatus Ehara wasclearly displayed under Scaning Electronic Microscope(SEM).

The theory of ion etching and the parameter of ion source designing are discussed in detail.

Influence of fabrication error in ion beam etching on diffractive optical element;

Fresnel lens fabricated by ion beam etching;

An Ion beam etching facility,model KZ-400 has been successfully designed and constructed to fabricate large-aperture(400 mm×400 mm) optical diffraction components.